公开(公告)号：US20230019004A1

公开(公告)日：2023-01-19

申请号：US17762206

申请日：2020-09-25

Applicant: SOUTHEAST UNIVERSITY ,  CSMC TECHNOLOGIES FAB2 CO., LTD.

Inventor： Jiaxing WEI ,  Qichao WANG ,  Kui XIAO ,  Dejin WANG ,  Li LU ,  Ling YANG ,  Ran YE ,  Siyang LIU ,  Weifeng SUN ,  Longxing SHI

IPC: H01L29/78

Abstract: A lateral double-diffused metal oxide semiconductor field effect transistor (LDMOS), including: a trench gate including a lower part inside a trench and an upper part outside the trench, a length of the lower part in a width direction of a conducting channel being less than that of the upper part, and the lower part extending into a body region and having a depth less than that of the body region; an insulation structure arranged between a drain region and the trench gate and extending downwards into a drift region, a depth of the insulation structure being less than that of the drift region.