ANTI-STICTION LAYER DEPOSITION
    1.
    发明申请

    公开(公告)号:US20250145448A1

    公开(公告)日:2025-05-08

    申请号:US18387697

    申请日:2023-11-07

    Abstract: An anti-stiction layer is formed from a first organosilane precursor. A second organosilane precursor is introduced around the workpiece with the anti-stiction layer. The second organosilane precursor is different from the first organosilane precursor. The second organosilane precursor is configured to eliminate defect sites and unreacted sites on the anti-stiction layer and on a surface of the workpiece that includes the anti-stiction layer.

    Method of forming a passivation layer on a substrate

    公开(公告)号:US10655217B2

    公开(公告)日:2020-05-19

    申请号:US15968433

    申请日:2018-05-01

    Abstract: A method of forming a passivation layer on a substrate includes providing a substrate in a processing chamber. The substrate includes a metallic surface which is a copper, tin or silver surface, or an alloyed surface of one or more of copper, tin or silver. The method further includes depositing at least one organic layer onto the metallic surface by vapour deposition, the organic layer formed from an organic precursor. The organic precursor includes a first functional group including at least one of oxygen, nitrogen, phosphorus, sulphur, selenium, tellurium, or silicon, and a second functional group selected from hydroxyl (—OH) or carboxyl (—COOH). The first functional group is adsorbed onto the metallic surface. The method further includes depositing at least one inorganic layer onto the organic layer by vapour deposition, wherein the second functional group acts as an attachment site for the inorganic layer.

    TEMPORARY PASSIVATION LAYER ON A SUBSTRATE

    公开(公告)号:US20220359332A1

    公开(公告)日:2022-11-10

    申请号:US17315342

    申请日:2021-05-09

    Abstract: A substrate includes a metal component on a surface. A polymeric layer is deposited on the surface using molecular layer deposition. The polymeric layer includes a metalcone and has a thickness from 1 nm to 20 nm. The polymeric layer is stable at room temperature, but will undergo a structural change at high temperatures. The polymeric layer can be annealed to cause a structural change, which can occur during soldering.

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