公开(公告)号：US08728337B2

公开(公告)日：2014-05-20

申请号：US13773711

申请日：2013-02-22

Applicant: SPTS Technologies Limited

Inventor： Carl Brancher ,  John MacNeil ,  Robert Trowell

IPC: H01L21/306

CPC classification number: H01L21/306 ,  B44C1/227 ,  C23C16/455 ,  C23C16/45544 ,  C23C16/45589 ,  H01L21/6719 ,  H01L21/67207

Abstract: A method is for processing a substrate. The method includes placing the substrate in a process volume and introducing a process gas or vapor into the process volume and/or subsequently removing gas or vapor from the volume. The step of introducing and/or removing the gas is at least partially performed by moving a movable wall to change the process volume in an appropriate sense.

Abstract translation: 一种用于处理衬底的方法。 该方法包括将基底放置在处理体积中并将工艺气体或蒸气引入到处理体积中和/或随后从体积中除去气体或蒸气。 引入和/或去除气体的步骤至少部分地通过移动可移动壁来适当地改变处理体积来执行。