公开(公告)号：US11758707B2

公开(公告)日：2023-09-12

申请号：US17118372

申请日：2020-12-10

Applicant: STMicroelectronics International N.V.

Inventor： Shafquat Jahan Ahmed ,  Kedar Janardan Dhori

IPC: H10B10/00

CPC classification number: H10B10/12 ,  H10B10/18

Abstract: A memory cell including a set of active regions that overlay a set of gate regions to form a pair of cross-coupled inverters. A first active region extends along a first axis. A first gate region extends transversely to the first active region and overlays the first active region to form a first transistor of the pair of cross-coupled inverters. A second gate region extends transversely to the first active region and overlays the first active region to form a second transistor of the pair of cross-coupled inverters. A second active region extends along a second axis and overlays the first gate region to form a third transistor of the pair of cross-coupled inverters. A fourth active region extending along a third axis and overlays a gate region to form a transistor of a read port.

公开(公告)号：US12250804B2

公开(公告)日：2025-03-11

申请号：US18454471

申请日：2023-08-23

Applicant: STMicroelectronics International N.V.

Inventor： Shafquat Jahan Ahmed ,  Dhori Kedar Janardan

IPC: H10B10/00

Abstract: A memory cell including a set of active regions that overlay a set of gate regions to form a pair of cross-coupled inverters. A first active region extends along a first axis. A first gate region extends transversely to the first active region and overlays the first active region to form a first transistor of the pair of cross-coupled inverters. A second gate region extends transversely to the first active region and overlays the first active region to form a second transistor of the pair of cross-coupled inverters. A second active region extends along a second axis and overlays the first gate region to form a third transistor of the pair of cross-coupled inverters. A fourth active region extending along a third axis and overlays a gate region to form a transistor of a read port.

公开(公告)号：US20240015945A1

公开(公告)日：2024-01-11

申请号：US18347435

申请日：2023-07-05

Applicant: STMicroelectronics SA ,  STMicroelectronics (Crolles 2) SAS ,  STMicroelectronics International N.V.

Inventor： Olivier Weber ,  Kedar Janardan Dhori ,  Promod Kumar ,  Shafquat Jahan Ahmed ,  Christophe Lecocq ,  Pascal Urard

IPC: H10B10/00 ,  G11C11/417

CPC classification number: H10B10/12 ,  H10B10/18 ,  G11C11/417

Abstract: In one embodiment, a semiconductor device includes a carrier substrate, a buried dielectric region overlying the carrier substrate, and a semiconductor film separated from the carrier substrate by the buried dielectric region. NMOS transistors and PMOS transistors are disposed at a surface of the semiconductor film and coupled together to form a static random access memory (SRAM) cell. The NMOS transistors and the PMOS transistors each include a gate dielectric layer having a thickness greater than three nanometers and an active region in the semiconductor film. The active region of the PMOS transistors are formed from a silicon-germanium alloy.