公开(公告)号：US20240404905A1

公开(公告)日：2024-12-05

申请号：US18538935

申请日：2023-12-13

Applicant: STMicroelectronics Pte Ltd

Inventor： Eng Hui GOH ,  Voon Cheng NGWAN ,  Fadhillawati TAHIR ,  Ditto ADNAN ,  Boon Kiat TUNG ,  Maurizio Gabriele CASTORINA

IPC: H01L23/31 ,  H01L21/02 ,  H01L27/06

Abstract: An integrated circuit device includes a metal contact and a passivation layer extending on a sidewall of the metal contact and on first and second surface portions of a top surface of the metal contact. The passivation layer is format by a stack of layers including: a tetraethyl orthosilicate (TEOS) layer; a Phosphorus doped TEOS (PTEOS) layer on top of the TEOS layer; and a Silicon-rich Nitride layer on top of the PTEOS layer. The TEOS and PTEOS layers extend over the first surface portion, but not the second surface portion, of the top surface of the metal contact. The Silicon-rich Nitride layer extends over both the first and second surface portions, and is in contact with the second surface portion.

公开(公告)号：US20220189840A1

公开(公告)日：2022-06-16

申请号：US17518215

申请日：2021-11-03

Applicant: STMicroelectronics Pte Ltd

Inventor： Eng Hui GOH ,  Voon Cheng NGWAN ,  Fadhillawati TAHIR ,  Ditto ADNAN ,  Boon Kiat TUNG ,  Maurizio Gabriele CASTORINA

IPC: H01L23/31 ,  H01L29/51 ,  H01L29/45

Abstract: An integrated circuit device includes a metal contact and a passivation layer extending on a sidewall of the metal contact and on first and second surface portions of a top surface of the metal contact. The passivation layer is format by a stack of layers including: a tetraethyl orthosilicate (TEOS) layer; a Phosphorus doped TEOS (PTEOS) layer on top of the TEOS layer; and a Silicon-rich Nitride layer on top of the PTEOS layer. The TEOS and PTEOS layers extend over the first surface portion, but not the second surface portion, of the top surface of the metal contact. The Silicon-rich Nitride layer extends over both the first and second surface portions, and is in contact with the second surface portion.