公开(公告)号：US09091924B2

公开(公告)日：2015-07-28

申请号：US13625210

申请日：2012-09-24

Applicant: STMicroelectronics Pte Ltd.

Inventor： Gino George ,  KeenYip Koh ,  CheeChiang Lee ,  Ditto Adnan

IPC: G01F7/00 ,  G03F7/16 ,  H01L21/67

CPC classification number: G03F7/16 ,  H01L21/6715

Abstract: A photoresist delivery system includes a photoresist pump, a photoresist reservoir coupled to the photoresist pump, and a photoresist container. A control valve is between the photoresist reservoir and the photoresist container and is movable from a closed position to an open position upon engagement of the photoresist container with the photoresist reservoir to replenish photoresist therein.

Abstract translation: 光致抗蚀剂传输系统包括光致抗蚀剂泵，耦合到光致抗蚀剂泵的光致抗蚀剂储存器和光致抗蚀剂容器。 控制阀位于光致抗蚀剂储存器和光致抗蚀剂容器之间，并且在光致抗蚀剂容器与光致抗蚀剂储存器接合时能够从关闭位置移动到打开位置，以补充其中的光致抗蚀剂。

公开(公告)号：US20140083557A1

公开(公告)日：2014-03-27

申请号：US13625210

申请日：2012-09-24

Applicant: STMICROELECTRONICS PTE LTD.

Inventor： Gino GEORGE ,  KeenYip Koh ,  CheeChiang LEE ,  Ditto ADNAN

IPC: B65B3/06

CPC classification number: G03F7/16 ,  H01L21/6715

Abstract: A photoresist delivery system includes a photoresist pump, a photoresist reservoir coupled to the photoresist pump, and a photoresist container. A control valve is between the photoresist reservoir and the photoresist container and is movable from a closed position to an open position upon engagement of the photoresist container with the photoresist reservoir to replenish photoresist therein.

Abstract translation: 光致抗蚀剂传输系统包括光致抗蚀剂泵，耦合到光致抗蚀剂泵的光致抗蚀剂储存器和光致抗蚀剂容器。 控制阀位于光致抗蚀剂储存器和光致抗蚀剂容器之间，并且在光致抗蚀剂容器与光致抗蚀剂储存器接合时能够从关闭位置移动到打开位置，以补充其中的光致抗蚀剂。