公开(公告)号：US09874813B2

公开(公告)日：2018-01-23

申请号：US14698904

申请日：2015-04-29

申请人： SUMITOMO BAKELITE CO., LTD.

发明人： Yuma Tanaka

IPC分类号： G03F7/023 ,  G03F7/004 ,  G03F7/038 ,  G03F7/022 ,  H05K3/28

CPC分类号： G03F7/0236 ,  G03F7/0045 ,  G03F7/0047 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/038 ,  H05K3/287 ,  H05K2201/0989

摘要： A photosensitive resin material of the invention is a photosensitive resin material used to form a permanent film including one or more selected from a novolac-type phenol resin, a phenol aralkyl resin, and a hydroxystyrene resin as an alkali-soluble resin (A) and a photosensitive diazoquinone compound as a photosensitizing agent (B), in which a content of iron with respect to all non-volatile components, which is measured through flameless atomic absorption spectroscopy, is equal to or more than 0.005 ppm and equal to or less than 80 ppm, and non-ionic iron is included as the iron.