公开(公告)号：US10389278B2

公开(公告)日：2019-08-20

申请号：US14776787

申请日：2014-03-11

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Yoshiaki Moriya ,  Kazuto Ando

IPC: H02N13/00 ,  H01L21/683 ,  H01L21/687

Abstract: Provided is an electrostatic chuck device in which the attachment of particles to the rear surface of a plate-like specimen can be further suppressed by suppressing the generation source of the particles and, furthermore, an effect of cooling the plate-like specimen using a cooling gas can be improved. The electrostatic chuck device is formed by including an electrostatic chuck portion in which an upper surface (2a) of a ceramic plate-like body (2) is used as a placement surface on which a wafer is placed and an electrostatic adsorption electrode is provided inside the ceramic plate-like body (2) or on the rear surface thereof, multiple protrusions (11) are formed on the upper surface (2a), and multiple fine protrusions (13) are formed in regions (12) excluding the multiple protrusions (11) in the upper surface (2a).

公开(公告)号：US11024528B2

公开(公告)日：2021-06-01

申请号：US15769672

申请日：2016-10-21

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Yoshiaki Moriya ,  Keigo Maki ,  Hitoshi Kouno ,  Kazuto Ando ,  Yuuki Kinpara

IPC: H01L21/683 ,  H01L21/687 ,  H01L21/67

Abstract: An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the placing surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.

公开(公告)号：US10475688B2

公开(公告)日：2019-11-12

申请号：US15550205

申请日：2016-02-03

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Kazunori Ishimura ,  Kazuto Ando ,  Kentaro Takahashi ,  Yuhki Kinpara ,  Shinichi Maeta ,  Mamoru Kosakai

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687

Abstract: An electrostatic chuck part of an electrostatic chuck device has an electrostatic chuck part inner peripheral surface surrounding an opening of a chuck part through-hole, and an electrostatic chuck part outer peripheral surface surrounding the electrostatic chuck part inner peripheral surface. An insulator has an insulator main body in which an insulator through-hole having an opening on the electrostatic chuck part side is formed, an insulator inner end face, and an insulator outer end face which faces the electrostatic chuck part outer peripheral surface. The insulator inner end face and the electrostatic chuck part inner peripheral surface are in contact with each other, or an adhesion layer or a plasma-resistant adhesive layer extends in a gap between the insulator inner end face and the electrostatic chuck part inner peripheral surface. The plasma-resistant adhesive layer is formed between the electrostatic chuck part outer peripheral surface and the insulator outer end face.