公开(公告)号：US12013638B2

公开(公告)日：2024-06-18

申请号：US17433946

申请日：2020-11-04

Applicant: SUZHOU POLLY NEW MATERIAL TECH CO., LTD.

Inventor： Wenbin Wang ,  Jie Xiong

IPC: G03F7/035 ,  G03F7/027 ,  G03F7/031 ,  G03F7/038 ,  B33Y10/00 ,  B33Y70/00

CPC classification number: G03F7/035 ,  G03F7/027 ,  G03F7/031 ,  G03F7/0382 ,  B33Y10/00 ,  B33Y70/00

Abstract: The present disclosure relates to a dual-cure phase-separation type photosensitive resin composition for continuous 3D printing with high precision, including an acrylate having a cross-linkable double bond, a polyurethane prepolymer, a chain extender, and a photoinitiator. The polyurethane prepolymer is produced by a reaction between an isocyanate and a polyether polyol with a molecular weight larger than or equal to 4000 under heating and catalytic action. The photosensitive resin composition of the present disclosure is used in the continuous 3D printing to make high precision parts.