公开(公告)号：US20130092085A1

公开(公告)日：2013-04-18

申请号：US13647974

申请日：2012-10-09

Applicant: Synos Technology, Inc.

Inventor： Sang In LEE

IPC: C23C16/458 ,  C23C16/04

CPC classification number: C23C16/45551

Abstract: Embodiments relate to a linear deposition apparatus with mechanism for securing a shadow mask and a substrate onto a susceptor. The linear deposition apparatus includes a set of members attached to latches that are raised to unlock the shadow mask and the substrate from the susceptor. The latches are lowered to secure the shadow mask and the substrate to the susceptor. Another set of members are provided in the linear deposition apparatus to move and align the shadow mask with the substrate. The linear deposition apparatus also includes a main body and two wings provided at both sides of the main body to receive the substrate as the substrate moves linearly to expose the substrate to materials or radicals injected by reactors.

Abstract translation: 实施例涉及具有用于将荫罩和基板固定到基座上的机构的线性沉积设备。 线性沉积装置包括附接到闩锁的一组构件，其被升高以从基座解锁荫罩和基板。 锁定器被降低以将荫罩和基板固定到基座。 在线性沉积设备中设置另一组构件以使荫罩与衬底移动和对齐。 线性沉积装置还包括主体和设置在主体的两侧的两个翼片，以在衬底线性移动时接收衬底，以将衬底暴露于由反应器注入的材料或自由基。

公开(公告)号：US20130122197A1

公开(公告)日：2013-05-16

申请号：US13666840

申请日：2012-11-01

Applicant: SYNOS TECHNOLOGY, INC.

Inventor： Sang In LEE

IPC: C23C16/04

CPC classification number: C23C16/042 ,  G03F7/12 ,  H01L51/0011

Abstract: Embodiments relate to a structure for securing a shadow mask and a susceptor where the top surface of the shadow mask mounted with the susceptor is flush with the top surface of the susceptor. When the susceptor is mounted with the shadow mask, the entire top surface of the susceptor and the shadow mask is substantially coplanar. A substrate onto which material is deposited is placed below the shadow mask. The susceptor moves below reactors for injecting materials or radicals. Since the entire top surface of the susceptor is substantially flat, the vertical distance between the reactors and the susceptor can be reduced, contributing to the overall quality of the layer formed on the substrate and reducing the materials wasted by leaking outside the gap between the susceptor and the reactors.

Abstract translation: 实施例涉及用于固定荫罩和基座的结构，其中安装有基座的荫罩的顶表面与基座的顶表面齐平。 当基座安装有荫罩时，基座的整个顶表面和荫罩基本上共面。 将沉积有材料的基板放置在荫罩下方。 感受器在反应器下方移动，用于注入材料或自由基。 由于基座的整个顶表面基本上是平坦的，因此能够减小反应器和基座之间的垂直距离，从而有助于在基板上形成的层的整体质量，并且减少由于基座之间的间隙泄漏而浪费的材料 和反应堆。