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公开(公告)号:US11707793B2
公开(公告)日:2023-07-25
申请号:US16651761
申请日:2018-09-28
申请人: Safran
发明人: Martin Ducas , Mirna Bechelany
IPC分类号: B23H7/26 , B23H1/04 , B23H7/36 , B23H9/10 , C04B35/10 , B33Y80/00 , B33Y40/20 , B33Y70/00 , B23H9/14
CPC分类号: B23H7/26 , B23H7/265 , B23H7/36 , B23H9/10 , B33Y40/20 , B33Y80/00 , C04B35/10 , B23H9/14 , B33Y70/00 , C04B2235/3217 , C04B2235/3244 , C04B2235/6026
摘要: The production of a device for holding one or more electrodes for electrical discharge machining, comprising a body having a rectilinear portion in which at least one first duct is provided for the passage of one or more electrode(s). The body further has an integral curved portion in which (at least) one second curved dielectric fluid supply duct is provided and in which is provided a curved extension of said at least one first duct. The curved extension and the second curved duct are made of ceramic, with an inner mean roughness of: Ra
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2.
公开(公告)号:US20200254546A1
公开(公告)日:2020-08-13
申请号:US16651761
申请日:2018-09-28
申请人: Safran
发明人: Martin Ducas , Mirna Bechelany
摘要: The invention relates to the production of a device for holding one or more electrode(s) for electrical discharge machining, comprising a body (41) having a rectilinear portion (43a) in which at least one first duct (45) is provided for the passage of one or more electrode(s) (21). The body further has an integral curved portion (43b) in which (at least) one second curved dielectric fluid supply duct (47) is provided and in which is provided a curved extension (45b) of said at least one first duct. The curved extension and the second curved duct are made of ceramic, with an inner mean roughness of: Ra
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