DEPOSITION SYSTEM AND METHOD FOR DISPLAY APPARATUS

    公开(公告)号:US20250137116A1

    公开(公告)日:2025-05-01

    申请号:US18820676

    申请日:2024-08-30

    Abstract: A deposition method for a display device includes continuously performing operations on at least two substrates arranged in a linear form in a process chamber. The operations include measuring a temperature of a surrounding area of a substrate while heating a deposition source of the deposition source device to a deposition-capable temperature in a deposition standby section, determining a heat influence distribution on the substrate or a mask based on measurement results provided by the heat distribution measurement unit, designing a cooling unit on top of the substrate or the mask in association with reducing the heat influence distribution on the substrate or the mask, installing or controlling the cooling unit in association with reducing the heat influence distribution, and performing a thin film deposition operation on the substrate while moving the deposition source device from the deposition standby section to a deposition area section.

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