ELECTROSTATIC CHUCK UNIT, LAMINATION APPARATUS AND METHOD OF LAMINATION

    公开(公告)号:US20250149371A1

    公开(公告)日:2025-05-08

    申请号:US18931528

    申请日:2024-10-30

    Abstract: An electrostatic chuck unit includes a first electrostatic chuck that includes a first plate that includes a surface that is concavely curved in a first direction and a first electrode pattern disposed on the surface of the first plate, and a second electrostatic chuck spaced apart from the first electrostatic chuck in a second direction opposite to the first direction and that includes a second plate that includes a surface adjacent to the first electrostatic chuck and that is convexly curved in the first direction and a second electrode pattern disposed on the surface of the second plate. Each of the first electrode pattern and the second electrode pattern includes an electrode, and a width of the electrode is between 10 mm and 30 mm.

Patent Agency Ranking