-
1.
公开(公告)号:US20180059454A1
公开(公告)日:2018-03-01
申请号:US15663211
申请日:2017-07-28
Applicant: Samsung Display Co., Ltd.
Inventor: Hee-Kyun SHIN , Eun-Kyung YEON , Seung-Ho KIM , Hyun-Joon OH , Woo-Jin CHO
IPC: G02F1/1345 , G09F9/302 , G09G3/3233
CPC classification number: G02F1/1345 , G02F1/133308 , G02F2001/133331 , G02F2201/50 , G09F9/302 , G09G3/006 , G09G3/3233
Abstract: A cover window is disclosed. The cover window may include a first surface, a second surface opposite the first surface, a first polishing surface extending from an end of the first surface along a first direction, the first polishing surface having a first inclination angle, and a second polishing surface extending from an end of the second surface along a second direction, the second polishing surface having a second inclination angle. The first polishing surface and the second polishing surface may be asymmetric with respect to a center plane, the center plane passing through a center of the cover window and in parallel with the first surface.
-
公开(公告)号:US20210008685A1
公开(公告)日:2021-01-14
申请号:US16926034
申请日:2020-07-10
Applicant: Samsung Display Co., LTD.
Inventor: Jung-Gun NAM , Seung-Bae KANG , Heesung YANG , Bonggu KANG , Joon-Hwa BAE , Woo-Jin CHO , Byoung-Kwon CHOO
IPC: B24B37/10 , B24B7/22 , H01L21/321
Abstract: A method of manufacturing a display and a chemical mechanical polishing method which employ a chemical mechanical polishing apparatus that includes a conveyor belt to transfer a substrate, a polishing head disposed on the conveyor belt, and a body part which moves the polishing head and supplies a slurry to the polishing head. The polishing head includes a first polishing part including a first polishing pad surrounding a first slurry outlet, and a second polishing part surrounding the first polishing part and including a second polishing pad. A second slurry outlet is formed between the first polishing part and the second polishing part, and the first polishing part and the second polishing part are movable independently of each other in a direction substantially perpendicular to the substrate.
-