公开(公告)号：US20210043661A1

公开(公告)日：2021-02-11

申请号：US16927327

申请日：2020-07-13

Applicant: Samsung Display Co., LTD. ,  UBmaterials lnc.

Inventor： Joon-Hwa BAE ,  Jin Hyung PARK ,  Bonggu KANG ,  Seungbae KANG ,  Heesung YANG ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L27/12 ,  H01L21/3105 ,  C09G1/02 ,  C09K3/14

Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

公开(公告)号：US20210008685A1

公开(公告)日：2021-01-14

申请号：US16926034

申请日：2020-07-10

Applicant: Samsung Display Co., LTD.

Inventor： Jung-Gun NAM ,  Seung-Bae KANG ,  Heesung YANG ,  Bonggu KANG ,  Joon-Hwa BAE ,  Woo-Jin CHO ,  Byoung-Kwon CHOO

IPC: B24B37/10 ,  B24B7/22 ,  H01L21/321

Abstract: A method of manufacturing a display and a chemical mechanical polishing method which employ a chemical mechanical polishing apparatus that includes a conveyor belt to transfer a substrate, a polishing head disposed on the conveyor belt, and a body part which moves the polishing head and supplies a slurry to the polishing head. The polishing head includes a first polishing part including a first polishing pad surrounding a first slurry outlet, and a second polishing part surrounding the first polishing part and including a second polishing pad. A second slurry outlet is formed between the first polishing part and the second polishing part, and the first polishing part and the second polishing part are movable independently of each other in a direction substantially perpendicular to the substrate.

公开(公告)号：US20250015098A1

公开(公告)日：2025-01-09

申请号：US18890313

申请日：2024-09-19

Applicant: Samsung Display Co., LTD. ,  UBmaterials lnc.

Inventor： Joon-Hwa BAE ,  Jin Hyung PARK ,  Bonggu KANG ,  Seungbae KANG ,  Heesung YANG ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L27/12 ,  C09G1/02 ,  C09K3/14 ,  H01L21/3105

Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

公开(公告)号：US20210273208A1

公开(公告)日：2021-09-02

申请号：US17324626

申请日：2021-05-19

Applicant: Samsung Display Co., LTD.

Inventor： Heesung YANG ,  Seung Bae KANG ,  Bonggu KANG ,  Tae Wook KANG ,  Joon-Hwa BAE ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L51/56 ,  H01L21/311 ,  H01L21/3105

Abstract: A display device includes a planarization layer covering transistors in a display area on a substrate, an organic light emitting diode on the planarization layer, a pad electrode in a non-display area on the substrate surrounding the display area, and a sacrificial layer remnant capping a side surface of the pad electrode.