DEPOSITION APPARATUS
    2.
    发明公开

    公开(公告)号:US20240200186A1

    公开(公告)日:2024-06-20

    申请号:US18496919

    申请日:2023-10-30

    IPC分类号: C23C16/04

    CPC分类号: C23C16/042

    摘要: An embodiment provides a deposition apparatus including a chamber; and a deposition source disposed in the chamber and including a plurality of nozzles arranged in a first direction. Each of the plurality of nozzles includes at least one first nozzle including a first nozzle hole spraying a first deposition material and a second nozzle hole spraying a second deposition material, and the deposition source further includes at least one angle controlling structure surrounding the at least one first nozzle.