公开(公告)号：US20230160688A1

公开(公告)日：2023-05-25

申请号：US17955660

申请日：2022-09-29

Applicant: Samsung Display Co., Ltd.

Inventor： JAISUN KYOUNG ,  YOUNGGIL PARK ,  JONGYUN PARK ,  SOOIM JEONG ,  DEOKHYUN HWANG

IPC: G01B11/06

CPC classification number: G01B11/0625 ,  G01B11/0641

Abstract: A substrate processing apparatus includes a chamber including an accommodation space, a stage disposed in the accommodation space and provided with a substrate disposed thereon, a deposition part disposed under the stage and spraying at least one deposition material to the substrate, and a measurement part disposed adjacent to the deposition part. The measurement part includes an accommodation portion provided with an opening defined through at least one surface thereof, a light source disposed in the accommodation portion and irradiating a first light, at least one transmission portion disposed in the opening, facing the light source, and receiving the first light, and a reception portion facing the at least one transmission portion and receiving the first light reflected from the at least one deposition material as a second light.