公开(公告)号：US20220399420A1

公开(公告)日：2022-12-15

申请号：US17679691

申请日：2022-02-24

Applicant: Samsung Display Co., Ltd.

Inventor： Jaehwan CHU ,  Meejae KANG ,  Keunwoo KIM ,  Doona KIM ,  Sangsub KIM ,  Hanbit KIM ,  Dokyeong LEE ,  Yongsu LEE

IPC: H01L27/32

Abstract: A method of manufacturing a display apparatus includes forming a first photosensitive pattern and a second photosensitive pattern of different thicknesses on an active layer; forming a driving semiconductor layer and a compensation semiconductor layer using the first photosensitive pattern and the second photosensitive pattern as masks to etch the active layer; exposing an upper surface of the driving semiconductor layer by etching the first photosensitive pattern and forming a third photosensitive pattern by etching at least a portion of the second photosensitive pattern; forming a first insulating layer on the driving semiconductor layer and the third photosensitive pattern; exposing an upper surface of the compensation semiconductor layer by stripping the third photosensitive pattern; and forming a second insulating layer on the first insulating layer and the compensation semiconductor layer.