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公开(公告)号:US20250159985A1
公开(公告)日:2025-05-15
申请号:US19006725
申请日:2024-12-31
Applicant: Samsung Display Co., Ltd.
Inventor: Kihwan SEOK , Hoonchul RYOO
IPC: H10D86/01
Abstract: A display device manufacturing method includes annealing a display substrate by irradiating a laser to the display substrate in different energy values, measuring a transmittance of the annealed display substrate, and determining an optimal crystallization value of the display substrate based on the transmittance, wherein the determining of the optimal crystallization value includes calculating an absorbance of the display substrate for each energy value of the laser based on the transmittance, calculating a band gap energy of the annealed display substrate for each energy value of the laser based on the absorbance, and determining an energy value of the laser corresponding to a minimum value of the band gap energy as the optimal crystallization value. Also provided is a display device manufacturing apparatus that may implement the manufacturing method.
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公开(公告)号:US20240057457A1
公开(公告)日:2024-02-15
申请号:US18119155
申请日:2023-03-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Kwangjun KOO , Donghoon SHIN , Hoonchul RYOO , Kyongsik CHOI , Jeongmok KIM , Jaewoong MOON , Dongeon LIM
IPC: H10K59/80 , H10K59/123
CPC classification number: H10K59/879 , H10K59/878 , H10K59/123
Abstract: A display apparatus manufacturing apparatus includes: a laser emitter for emitting a laser having dispersion in a short-axis direction greater than dispersion in a long-axis direction, and a laser converter for converting the laser into a converted laser having dispersion in the long-axis direction greater than dispersion in the short-axis direction.
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公开(公告)号:US20150198516A1
公开(公告)日:2015-07-16
申请号:US14453228
申请日:2014-08-06
Applicant: Samsung Display Co., Ltd.
Inventor: Eun-Ju SONG , Hoonchul RYOO
CPC classification number: G01N15/0606 , G01L21/22 , G01N15/0656 , G01N29/2443 , G01N2015/0046 , G01N2291/02408 , G01N2291/0256 , G01N2291/02872
Abstract: A vacuum apparatus includes a vacuum chamber, first sensor units disposed in the vacuum chamber facing a deposition direction of particles, and second sensor units disposed in the vacuum chamber, each disposed on a corresponding first sensor of the first sensor units facing the deposition direction, wherein the first sensor units are configured to sense a pressure in the vacuum chamber and an absorption amount of the particles adsorbed to the first sensor units, and the second sensor units are configured to sense the pressure in the vacuum chamber.
Abstract translation: 真空装置包括真空室,设置在真空室中的与颗粒沉积方向相对的第一传感器单元和设置在真空室中的第二传感器单元,每个传感器单元设置在面向沉积方向的第一传感器单元的对应的第一传感器上, 其中所述第一传感器单元构造成感测所述真空室中的压力和吸附到所述第一传感器单元的所述颗粒的吸收量,并且所述第二传感器单元构造成感测所述真空室中的压力。
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