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公开(公告)号：US20160186313A1
公开(公告)日：2016-06-30
申请号：US15065773
申请日：2016-03-09
Applicant: Samsung Display Co., Ltd.
Inventor： Yong Hun Jo , Jae Hong Ahn , Jong Woo Lee
CPC classification number: C23C14/547 , C23C14/24 , C23C14/243 , C23C14/545
Abstract: A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time.
Abstract translation: 公开了一种薄膜沉积设备和方法。 在一个方面，沉积设备包括沉积源，其沉积在衬底的表面上，沉积源的移动单元，沉积在表面上的沉积材料的厚度的厚度测量传感器 以及转印控制器，其根据每单位时间内沉积在基板表面上的沉积材料的厚度调节转印单元的移动速度。
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公开(公告)号：US20140170301A1
公开(公告)日：2014-06-19
申请号：US13797573
申请日：2013-03-12
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Yong Hun Jo , Jae Hong Ahn , Jong Woo Lee
IPC: C23C16/52
CPC classification number: C23C14/547 , C23C14/24 , C23C14/243 , C23C14/545
Abstract: A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time.
Abstract translation: 公开了一种薄膜沉积设备和方法。 在一个方面，沉积设备包括沉积源，其沉积在衬底的表面上，沉积源的移动单元，沉积在表面上的沉积材料的厚度的厚度测量传感器 以及转印控制器，其根据每单位时间内沉积在基板表面上的沉积材料的厚度调节转印单元的移动速度。
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