公开(公告)号：US20180021985A1

公开(公告)日：2018-01-25

申请号：US15652184

申请日：2017-07-17

Applicant: Samsung Display Co., Ltd.

Inventor： Daehwan JANG ,  Seung-Won PARK ,  Baehyoun JUNG ,  Eunjung KIM ,  Jihun KIM ,  Yunjong YEO ,  Hyungbin CHO ,  Sang-Hoon LEE ,  Yong-Hwan RYU ,  Sung-Young CHOI ,  Hyunju KANG

IPC: B29C33/42 ,  G03F7/00 ,  B29C33/38 ,  B29C59/04

CPC classification number: B29C33/428 ,  B29C33/3807 ,  B29C33/3842 ,  B29C33/424 ,  B29C59/046 ,  B29C2035/0827 ,  B29K2845/00 ,  G03F7/0002

Abstract: A method of manufacturing a roll type imprint master mold including disposing a base layer on a substrate including a first area and a second area adjacent to the first area, disposing an inorganic insulation layer on the base layer, forming a first mask pattern and a first resin pattern in the first area, forming a pattern layer by etching the inorganic insulation layer using the first resin and the first mask patterns as a mask, removing the first resin and the first mask patterns, forming a second mask pattern and a second resin pattern in the second area, forming a pattern layer by etching the inorganic insulation layer using the second resin and the second mask patterns as a mask, removing the second resin and the second mask patterns, separating the base layer from the substrate, and attaching the base layer onto a roll body.