MASK FOR DEPOSITION
    2.
    发明申请
    MASK FOR DEPOSITION 有权
    掩蔽掩蔽

    公开(公告)号:US20150007768A1

    公开(公告)日:2015-01-08

    申请号:US14217875

    申请日:2014-03-18

    Inventor: Sang Yun LEE

    Abstract: A mask for deposition includes a plurality of deposition pattern parts arranged spaced apart from each other in a first direction, and a plurality of pattern openings defined in each deposition pattern part; a plurality of dummy pattern parts disposed at opposing sides of the plurality of deposition pattern parts in the first direction, respectively, and a plurality of recesses defined in each dummy pattern part; and a plurality of fixing parts respectively disposed at external sides of outermost dummy pattern parts among the plurality of dummy pattern parts, in the first direction. A maximum thickness of the each dummy pattern part is equal to or larger than a maximum thickness of the each deposition pattern part, and is smaller than a maximum thickness of each fixing part.

    Abstract translation: 用于沉积的掩模包括沿第一方向彼此间隔布置的多个沉积图案部分和在每个沉积图案部分中限定的多个图案开口; 分别设置在所述多个沉积图案部分的所述第一方向的相对侧的多个虚拟图案部分和限定在每个虚拟图案部分中的多个凹部; 以及多个固定部分,其分别设置在所述多个虚拟图案部分中的最外面的虚拟图案部分的外侧,沿着所述第一方向。 每个假图形部分的最大厚度等于或大于每个沉积图案部分的最大厚度,并且小于每个固定部分的最大厚度。

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