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公开(公告)号：US20210150177A1
公开(公告)日：2021-05-20
申请号：US16999672
申请日：2020-08-21
Applicant: Samsung Display Co., Ltd.
Inventor： SangJin PARK , Cha-Dong KIM , Heena KIM , Inkyung YOO , SungBae JU , Taehyeok CHOI
Abstract: An optical sensor includes: a sensing unit including a first sensing electrode, a second sensing electrode spaced apart from the first sensing electrode, and a sensing layer between the first sensing electrode and the second sensing electrode, the sensing layer containing amorphous silicon and germanium (Ge) ions impregnated in the amorphous silicon; and an optical pattern unit on the sensing unit and including a light shielding pattern and a plurality of transmission patterns in the light shielding pattern, wherein the sensing layer includes a first region, a second region, and a third region sequentially arranged from a boundary between the second sensing electrode and the sensing layer toward the first electrode, and a concentration of the germanium (Ge) ions in the amorphous silicon is relatively higher in the second region than in the first region and the third region.
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公开(公告)号：US20220216405A1
公开(公告)日：2022-07-07
申请号：US17703195
申请日：2022-03-24
Applicant: Samsung Display Co., Ltd.
Inventor： Inkyung YOO , SangJin PARK , Donghyun YANG , Sungbae JU
Abstract: A method for manufacturing a mask includes providing a mask mother substrate including a first portion and a plurality of second portions adjacent to the first portion, forming a reflecting plate on the mask mother substrate, forming a photoresist layer on the reflecting plate, removing a third portion of the photoresist layer that overlaps the plurality of second portions using an auxiliary mask, removing a fourth portion of the reflecting plate that overlaps the plurality of second portions, and removing the plurality of second portions of the mask mother substrate using a laser.
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公开(公告)号：US20200152872A1
公开(公告)日：2020-05-14
申请号：US16601490
申请日：2019-10-14
Applicant: Samsung Display Co., Ltd.
Inventor： Inkyung YOO , SangJin PARK , Donghyun YANG , Sungbae JU
Abstract: A method for manufacturing a mask includes providing a mask mother substrate including a first portion and a plurality of second portions adjacent to the first portion, forming a reflecting plate on the mask mother substrate, forming a photoresist layer on the reflecting plate, removing a third portion of the photoresist layer that overlaps the plurality of second portions using an auxiliary mask, removing a fourth portion of the reflecting plate that overlaps the plurality of second portions, and removing the plurality of second portions of the mask mother substrate using a laser.
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