Method of manufacturing display apparatus using etching buffer layer
    1.
    发明授权
    Method of manufacturing display apparatus using etching buffer layer 有权
    使用蚀刻缓冲层制造显示装置的方法

    公开(公告)号:US09472583B2

    公开(公告)日:2016-10-18

    申请号:US14455812

    申请日:2014-08-08

    Abstract: A method of manufacturing a display device including providing a substrate, forming a semiconductor layer on the substrate, forming a first insulating layer on the semiconductor layer, forming a metal layer on the first insulating layer, forming a second insulating layer on the metal layer, forming an etching buffer layer on the second insulating layer, forming a photosensitive film pattern on the etching buffer layer, and etching the etching buffer layer and the first and second insulating layers to expose the semiconductor layer.

    Abstract translation: 一种制造显示装置的方法,包括提供基板,在所述基板上形成半导体层,在所述半导体层上形成第一绝缘层,在所述第一绝缘层上形成金属层,在所述金属层上形成第二绝缘层, 在所述第二绝缘层上形成蚀刻缓冲层,在所述蚀刻缓冲层上形成感光膜图案,蚀刻所述蚀刻缓冲层以及所述第一绝缘层和所述第二绝缘层以暴露所述半导体层。

    Organic light emitting diode display and repairing method thereof

    公开(公告)号:US09647051B2

    公开(公告)日:2017-05-09

    申请号:US14818607

    申请日:2015-08-05

    CPC classification number: H01L27/3276 H01L2251/568

    Abstract: An organic light emitting diode display includes an emission control connector between a driving transistor and an organic light emitting diode of a pixel. The emission control connector connects the driving transistor and the organic light emitting diode and overlaps a portion of a repair line. A first shorting assistance member overlaps the repair line and the emission control connector, and serves to induce a chain reaction to allow a short to form between the repair line and the emission control connector when a low-energy laser beam is applied.

    METHOD OF MANUFACTURING DISPLAY APPARATUS
    3.
    发明申请
    METHOD OF MANUFACTURING DISPLAY APPARATUS 有权
    制造显示装置的方法

    公开(公告)号:US20150147837A1

    公开(公告)日:2015-05-28

    申请号:US14455812

    申请日:2014-08-08

    Abstract: A method of manufacturing a display device including providing a substrate, forming a semiconductor layer on the substrate, forming a first insulating layer on the semiconductor layer, forming a metal layer on the first insulating layer, forming a second insulating layer on the metal layer, forming an etching buffer layer on the second insulating layer, forming a photosensitive film pattern on the etching buffer layer, and etching the etching buffer layer and the first and second insulating layers to expose the semiconductor layer.

    Abstract translation: 一种制造显示装置的方法,包括提供基板,在所述基板上形成半导体层,在所述半导体层上形成第一绝缘层,在所述第一绝缘层上形成金属层,在所述金属层上形成第二绝缘层, 在所述第二绝缘层上形成蚀刻缓冲层,在所述蚀刻缓冲层上形成感光膜图案,蚀刻所述蚀刻缓冲层以及所述第一绝缘层和所述第二绝缘层以暴露所述半导体层。

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