公开(公告)号：US20150027883A1

公开(公告)日：2015-01-29

申请号：US14109276

申请日：2013-12-17

Applicant: Samsung Display Co., Ltd.

Inventor： Hun Kim ,  Jin-Woo Park ,  Ou-Hyen Kim ,  Sun-Jin Lee

IPC: H01J37/34

CPC classification number: H01J37/3417 ,  H01J37/345 ,  H01J37/3452

Abstract: A sputtering apparatus includes a plurality of targets arranged to face each other and a magnetic unit producing magnetic field. A space between the targets is disposed on a substrate on which a deposition is being made during a sputtering process. The magnetic unit includes at least two magnet members. The space between the targets is surrounded by a space between the at least two magnet members. Each of the magnet members includes at least one first magnet and at least one second magnet separated from each other with an interval.

Abstract translation: 溅射装置包括彼此面对的多个靶和产生磁场的磁性单元。 靶之间的空间设置在溅射过程中在其上进行沉积的基板上。 磁性单元包括至少两个磁体构件。 目标之间的空间由至少两个磁体构件之间的空间包围。 每个磁体构件包括至少一个第一磁体和至少一个彼此以间隔分开的第二磁体。