公开(公告)号：US20210327927A1

公开(公告)日：2021-10-21

申请号：US17074947

申请日：2020-10-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： YONG-HWAN RYU ,  Woo Jin Cho ,  Jong-Hyun Choung ,  Jae Uoon Kim ,  Sun-Jin Song ,  Hyun Duck Cho

IPC: H01L27/12 ,  G03F7/038

Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.

公开(公告)号：US11594561B2

公开(公告)日：2023-02-28

申请号：US17074947

申请日：2020-10-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Hwan Ryu ,  Woo Jin Cho ,  Jong-Hyun Choung ,  Jae Uoon Kim ,  Sun-Jin Song ,  Hyun Duck Cho

IPC: H01L27/12 ,  G03F7/038 ,  H01L21/027 ,  G03F7/00 ,  C23F1/00 ,  C23C16/44

Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.

公开(公告)号：US11590542B2

公开(公告)日：2023-02-28

申请号：US16918013

申请日：2020-07-01

Applicant: Samsung Display Co., Ltd.

Inventor： Yong-Hwan Ryu ,  Jiae Kim ,  Yunji Nam ,  Sun-Jin Song ,  In-Ja Han

IPC: B08B3/14 ,  B08B7/04 ,  H01L21/67 ,  C23C16/04 ,  H01L27/32 ,  H01L51/52

Abstract: A particle collection device includes a collection sheet and a frame on which the collection sheet is mounted. The collection sheet includes a base sheet, a magnetic substance, and a metal protrusion disposed on the base sheet to be adjacent to the magnetic substance.