公开(公告)号：US12162793B2

公开(公告)日：2024-12-10

申请号：US17577846

申请日：2022-01-18

Applicant: Samsung Display Co., Ltd.

Inventor： Cheollae Roh ,  Voronov Alexander ,  Hyungsik Kim ,  Emil Aslanov ,  Sunggyu Park ,  Joongsung Lee ,  Woohyun Jung

IPC: C03B33/02 ,  C03C15/00

Abstract: A window manufacturing method includes providing a mother substrate on a moving stage, the mother substrate including a cutting line; irradiating substantially simultaneously a first beam and a second beam to the mother substrate to cut the mother substrate and to form a target substrate; separating the target substrate from the mother substrate; and providing an etchant to the target substrate to chamfer the target substrate. The first beam is irradiated to the cutting line of the mother substrate, the second beam is irradiated to a point spaced apart from the cutting line of the mother substrate by a distance, and a pulse energy of the first beam is different from a pulse energy of the second beam.

公开(公告)号：US11574833B2

公开(公告)日：2023-02-07

申请号：US17172056

申请日：2021-02-09

Applicant: Samsung Display Co., Ltd.

Inventor： Juhee Lee ,  Cheollae Roh ,  Soo Beom Jo ,  Myungsoo Huh ,  Voronov Alexander ,  Jiwon Yeon ,  Haeyoung Yoo ,  Yongmun Chang

IPC: H02N13/00 ,  H01L21/683 ,  B23Q3/15

Abstract: An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

公开(公告)号：US20190126406A1

公开(公告)日：2019-05-02

申请号：US16166170

申请日：2018-10-22

Applicant: Samsung Display Co., Ltd.

Inventor： Taras Litoshenko ,  Voronov Alexander ,  Gyoowan Han

IPC: B23K26/382 ,  B23K26/082 ,  B23K26/067 ,  B23K26/06 ,  B23K26/0622 ,  C23C14/04 ,  C23C16/04

Abstract: A method of manufacturing a deposition mask including: arranging a deposition mask to be processed on a stage and forming a deposition hole in the deposition mask by irradiating the deposition mask with a laser beam. The laser beam forming the deposition hole is irradiated plural times in an identical moving path in a region where the deposition hole is formed, the laser beam includes a pulse laser, and pulse energy of the laser beam when the laser beam is irradiated once is different from pulse energy of the laser beam when the laser beam is irradiated twice.

公开(公告)号：US20210358791A1

公开(公告)日：2021-11-18

申请号：US17172056

申请日：2021-02-09

Applicant: Samsung Display Co., Ltd.

Inventor： Juhee Lee ,  Cheollae Roh ,  Soo Beom Jo ,  Myungsoo Huh ,  Voronov Alexander ,  Jiwon Yeon ,  Haeyoung Yoo ,  Yongmun Chang

IPC: H01L21/683 ,  H02N13/00 ,  B23Q3/15

Abstract: An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

公开(公告)号：US11148230B2

公开(公告)日：2021-10-19

申请号：US16166170

申请日：2018-10-22

Applicant: Samsung Display Co., Ltd.

Inventor： Taras Litoshenko ,  Voronov Alexander ,  Gyoowan Han

IPC: B23K26/382 ,  B23K26/082 ,  B23K26/067 ,  B23K26/0622 ,  C23C14/04 ,  C23C16/04 ,  B23K26/06 ,  H01L51/00

Abstract: A method of manufacturing a deposition mask including: arranging a deposition mask to be processed on a stage and forming a deposition hole in the deposition mask by irradiating the deposition mask with a laser beam. The laser beam forming the deposition hole is irradiated plural times in an identical moving path in a region where the deposition hole is formed, the laser beam includes a pulse laser, and pulse energy of the laser beam when the laser beam is irradiated once is different from pulse energy of the laser beam when the laser beam is irradiated twice.