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公开(公告)号：US10043998B2
公开(公告)日：2018-08-07
申请号：US15442095
申请日：2017-02-24
Inventor： Myungsoo Huh , Sungmin Cho , Dongkyun Ko , Sungchul Kim , Inkyo Kim , Cheollae Roh , Sangjoon Seo , Seungwoo Seo , Choelmin Jang
IPC: H01L51/50 , H01L51/52 , C23C16/455 , H01L51/56 , H01L27/32
Abstract: A display apparatus and an apparatus for and method of manufacturing the display apparatus. The display apparatus includes: a substrate; a display unit formed on the substrate; and a thin film encapsulation layer formed on the display unit. The thin film encapsulation layer includes an inorganic layer, and the inorganic layer includes a first sub-inorganic layer including a compound oxide including at least two of aluminum (Al), zinc (Zn), zirconium (Zn), and hafnium (Hf).
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公开(公告)号：US09722206B2
公开(公告)日：2017-08-01
申请号：US14811729
申请日：2015-07-28
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myungsoo Huh , Sunghun Key , Sungchul Kim , Cheollae Roh , Sukwon Jung , Hyunwoo Joo , Jaihyuk Choi
IPC: H01L33/00 , H01L51/52 , H01J37/32 , C23C16/04 , C23C16/34 , C23C16/455 , C23C16/505
CPC classification number: H01L51/5256 , C23C16/042 , C23C16/345 , C23C16/45565 , C23C16/505 , H01J37/32091 , H01J37/3244
Abstract: A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5×10−5 g/m2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.
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公开(公告)号：US12157693B2
公开(公告)日：2024-12-03
申请号：US17715547
申请日：2022-04-07
Applicant: Samsung Display Co., Ltd. , DOWOOINSYS CO., LTD.
Inventor： Hyungsik Kim , Cheollae Roh , Jang Doo Lee , Beomsoo Kim , Hanggyun Park , Joongsung Lee , Woohyun Jung , Seungjun Yi , Hyungsup Lee , Sunhong Choi
IPC: C03B33/023 , B23K26/06 , B23K26/38 , B23K26/402 , C03B33/02 , C03C15/00 , B23K103/00
Abstract: A method of manufacturing a window and a window manufactured by the same are provided. A method of manufacturing a window includes laser cutting a base glass into a preliminary window using first laser light, irradiating, with second laser light, a point spaced apart from an edge of the preliminary window at a first distance, and providing a window including a flat portion and an edge portion by wet etching the preliminary window irradiated with the second laser light. A method of manufacturing a window having a chamfer shape at the edge portion is facilitated.
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公开(公告)号：US11351632B2
公开(公告)日：2022-06-07
申请号：US16191575
申请日：2018-11-15
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jaebum Pahk , Jeongho Yi , Dokyun Kwon , Kyongho Hong , Jihun Kang , Cheollae Roh , Gyoowan Han
IPC: B23K26/142 , B23K26/14 , B23K26/16 , B23K26/38 , B23K26/402 , B23K37/04 , B23K101/36
Abstract: A particle removal device includes: a stage on which a target substrate is disposed; an inner case defining a first discharge opening through which the stage is exposed to an internal space of the inner case; an outer case including: a side wall portion surrounding the inner case, a protrusion portion protruded from the side wall portion toward the inner case, and a second discharge opening in fluid connection with the first discharge opening; a suction pump connected to the second discharge opening; an air injector in fluid connection with the internal space; and an intake opening in fluid connection with the first and second discharge openings. A width of the intake opening as a distance between the distal end of the inner case and the distal end of the protrusion portion is smaller than a width of the first discharge opening.
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公开(公告)号：US20210358791A1
公开(公告)日：2021-11-18
申请号：US17172056
申请日：2021-02-09
Applicant: Samsung Display Co., Ltd.
Inventor： Juhee Lee , Cheollae Roh , Soo Beom Jo , Myungsoo Huh , Voronov Alexander , Jiwon Yeon , Haeyoung Yoo , Yongmun Chang
IPC: H01L21/683 , H02N13/00 , B23Q3/15
Abstract: An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.
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Patent Agency Ranking
公开(公告)号：US10211427B2
公开(公告)日：2019-02-19
申请号：US15640945
申请日：2017-07-03
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myungsoo Huh , Sunghun Key , Sungchul Kim , Cheollae Roh , Sukwon Jung , Hyunwoo Joo , Jaihyuk Choi
IPC: H01L51/52 , H01J37/32 , C23C16/04 , C23C16/34 , C23C16/455 , C23C16/505
Abstract: A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5×10−5 g/m2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.
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公开(公告)号：US12162793B2
公开(公告)日：2024-12-10
申请号：US17577846
申请日：2022-01-18
Applicant: Samsung Display Co., Ltd.
Inventor： Cheollae Roh , Voronov Alexander , Hyungsik Kim , Emil Aslanov , Sunggyu Park , Joongsung Lee , Woohyun Jung
Abstract: A window manufacturing method includes providing a mother substrate on a moving stage, the mother substrate including a cutting line; irradiating substantially simultaneously a first beam and a second beam to the mother substrate to cut the mother substrate and to form a target substrate; separating the target substrate from the mother substrate; and providing an etchant to the target substrate to chamfer the target substrate. The first beam is irradiated to the cutting line of the mother substrate, the second beam is irradiated to a point spaced apart from the cutting line of the mother substrate by a distance, and a pulse energy of the first beam is different from a pulse energy of the second beam.
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公开(公告)号：US10910588B2
公开(公告)日：2021-02-02
申请号：US16401056
申请日：2019-05-01
Applicant: Samsung Display Co., Ltd.
Inventor： Hyoung-Joo Kim , Yunsoo Kim , Jun-Hee Lee , Cheollae Roh , Gyoowan Han
IPC: H01L51/52 , G06F3/041 , G02B5/30 , H05K5/00 , G06F3/0488
Abstract: A display device includes a substrate including an upper surface, a lower surface, and side surfaces; a display element layer on the upper surface overlapping the display area; an encapsulation layer on the upper surface, the encapsulation layer including a main part that overlaps the display element layer and a protruding part that protrudes along a first direction from the main part and overlaps the bezel area; an input sensor on the main part; a first circuit board facing the main part, overlapping the bezel area, and on the upper surface; and a second circuit board on the protruding part, wherein each of the first circuit board and the second circuit board is adjacent to a first side surface among the side surfaces, and in the first direction, the protruding part is more adjacent to the first side surface than the main part.
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公开(公告)号：US20200024724A1
公开(公告)日：2020-01-23
申请号：US16354006
申请日：2019-03-14
Applicant: Samsung Display Co., Ltd.
Inventor： Sangjin Han , Junha Park , Myungsoo Huh , Cheollae Roh , Seongho Jeong
Abstract: An apparatus for manufacturing a display apparatus includes a chamber configured to accommodate a first display substrate and a second display substrate therein, a deposition source positioned in the chamber and comprising a plurality of crucibles configured to move and supply at least two deposition materials to the first display substrate or the second display substrate, a mask assembly arranged between the first display substrate or the second display substrate and the deposition source, and a shutter portion arranged between the mask assembly and the deposition source and configured to control an amount of the at least two deposition materials supplied from the plurality of crucibles.
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公开(公告)号：US20160133873A1
公开(公告)日：2016-05-12
申请号：US14811729
申请日：2015-07-28
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myungsoo Huh , Sunghun Key , Sungchul Kim , Cheollae Roh , Sukwon Jung , Hyunwoo Joo , Jaihyuk Choi
CPC classification number: H01L51/5256 , C23C16/042 , C23C16/345 , C23C16/45565 , C23C16/505 , H01J37/32091 , H01J37/3244
Abstract: A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5×10−5 g/m2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.
Abstract translation: 公开了一种显示装置及其制造方法。 显示装置包括：基板; 形成在所述基板上的显示单元; 以及形成在所述显示单元上的无机层，其中所述无机层的水蒸气透过率（WVTR）为5×10 -5 g / m 2·天以下。 用于制造显示装置的装置包括：腔室; 用于将混合气体喷射到所述室中的淋浴头; 用于从所述混合气体形成等离子体的等离子体产生单元; 面向淋浴喷头的感受器，其上安置有基底; 以及电连接到所述等离子体产生单元的电源单元，其中从所述电源单元提供给所述等离子体产生单元的电流的频率在约27MHz至约42MHz之间。
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