公开(公告)号：US11574833B2

公开(公告)日：2023-02-07

申请号：US17172056

申请日：2021-02-09

Applicant: Samsung Display Co., Ltd.

Inventor： Juhee Lee ,  Cheollae Roh ,  Soo Beom Jo ,  Myungsoo Huh ,  Voronov Alexander ,  Jiwon Yeon ,  Haeyoung Yoo ,  Yongmun Chang

IPC: H02N13/00 ,  H01L21/683 ,  B23Q3/15

Abstract: An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

公开(公告)号：US20210358791A1

公开(公告)日：2021-11-18

申请号：US17172056

申请日：2021-02-09

Applicant: Samsung Display Co., Ltd.

Inventor： Juhee Lee ,  Cheollae Roh ,  Soo Beom Jo ,  Myungsoo Huh ,  Voronov Alexander ,  Jiwon Yeon ,  Haeyoung Yoo ,  Yongmun Chang

IPC: H01L21/683 ,  H02N13/00 ,  B23Q3/15

Abstract: An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

公开(公告)号：US20190341277A1

公开(公告)日：2019-11-07

申请号：US16173950

申请日：2018-10-29

Applicant: Samsung Display Co., Ltd.

Inventor： Haeyoung Yoo ,  Taejong Kim ,  Juhee Lee ,  Myungsoo Huh ,  Jaekyu Park ,  Hyunwoo Joo

IPC: H01L21/67 ,  H01J37/32 ,  H01L27/12 ,  H01L21/311 ,  H01L27/32 ,  H01L21/027

Abstract: Provided is a display device manufacturing apparatus and a manufacturing method of a display device. The display device manufacturing apparatus includes: a chamber; a supporter arranged in the chamber and supporting a substrate; an electrode arranged in the chamber so as to face the supporter; a gas supply arranged in the chamber and configured to supply process gas into the chamber; a first baffle arranged at a rim of the supporter and having at least one first through hole; and a second baffle arranged between the first baffle and the chamber and covering the at least one first through hole in a plan view to alter a path of by-products discharged from the chamber.

公开(公告)号：US10796933B2

公开(公告)日：2020-10-06

申请号：US16173950

申请日：2018-10-29

Applicant: Samsung Display Co., Ltd.

Inventor： Haeyoung Yoo ,  Taejong Kim ,  Juhee Lee ,  Myungsoo Huh ,  Jaekyu Park ,  Hyunwoo Joo

IPC: H01L21/67 ,  H01J37/32 ,  H01L27/12 ,  H01L21/311 ,  H01L21/027 ,  H01L27/32

Abstract: Provided is a display device manufacturing apparatus and a manufacturing method of a display device. The display device manufacturing apparatus includes: a chamber; a supporter arranged in the chamber and supporting a substrate; an electrode arranged in the chamber so as to face the supporter; a gas supply arranged in the chamber and configured to supply process gas into the chamber; a first baffle arranged at a rim of the supporter and having at least one first through hole; and a second baffle arranged between the first baffle and the chamber and covering the at least one first through hole in a plan view to alter a path of by-products discharged from the chamber.

公开(公告)号：US10480062B2

公开(公告)日：2019-11-19

申请号：US15395274

申请日：2016-12-30

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Seungho Choi ,  Haeyoung Yoo ,  Kanghee Lee

IPC: H01J37/34 ,  C23C14/35 ,  H01J37/32 ,  H01F7/02 ,  H01F7/20

Abstract: A sputtering apparatus includes a substrate holder, a first counterpart target area, a second counterpart target area, and a power supply. The first counterpart target area includes a first target and at least one first magnetic part and operates to form a magnetic field in a first plasma area adjacent to the first target. The second counterpart target area includes a second target and at least one second magnetic part and operates to form a magnetic field in a second plasma area adjacent to the second target. The power supply supplies a first power voltage to the first and second targets. A control anode faces the substrate holder in a second direction, with the first and second plasma areas therebetween, and receives a control voltage greater than the first power voltage.