Methods of fabricating semiconductor devices and underfill equipment for the same
    1.
    发明授权
    Methods of fabricating semiconductor devices and underfill equipment for the same 有权
    制造半导体器件和底部填充设备的方法相同

    公开(公告)号:US08956923B2

    公开(公告)日:2015-02-17

    申请号:US13835749

    申请日:2013-03-15

    摘要: A method of fabricating a semiconductor device comprises loading a circuit board including a semiconductor chip into underfill equipment, positioning the circuit board on a depositing chuck of the underfill equipment, filling an underfill material in a space between the semiconductor chip and the circuit board placed on the depositing chuck; transferring the circuit board including the underfill material so that it is positioned on a post-treatment chuck of the underfill equipment; heating the underfill material of the circuit board placed on the post-treatment chuck in a vacuum state, and unloading the circuit board, of which the underfill material has been heated in the vacuum state, from the underfill equipment.

    摘要翻译: 一种制造半导体器件的方法包括将包括半导体芯片的电路板加载到底部填充设备中,将电路板定位在底部填充设备的沉积卡盘上,在半导体芯片和放置在半导体芯片之间的电路板之间的空间中填充底部填充材料 沉积卡盘; 传送包括底部填充材料的电路板,使其位于底部填充设备的后处理卡盘上; 在真空状态下加热放置在后处理卡盘上的电路板的底部填充材料,并将底部填充材料在真空状态下被加热的电路板从底部填充设备卸载。