公开(公告)号：US20150369588A1

公开(公告)日：2015-12-24

申请号：US14839553

申请日：2015-08-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kwang Soo KIM ,  Hyun Jae LEE ,  Byeong Hwan JEON ,  Chang Hoon CHOI

IPC: G01B11/00

CPC classification number: G01B11/00 ,  G01B11/24 ,  G01B11/28 ,  G01B2210/56

Abstract: According to example embodiments, an optical measurement apparatus may include: a station configured to support a measurement target; an image acquisition unit configured to acquire a one-dimensional (1D) line image of the measurement target; a driver configured to move the station and the image acquisition unit; and a controller. The controller may be configured to control the driver and the image acquisition unit to acquire a plurality of 1D line images of the measurement target while varying a distance between the image acquisition unit and the measurement target to generate a two-dimensional (2D) scan image from combining the plurality of 1D line images; and to detect a pattern of the measurement target based on comparing a plurality of 2D reference images and the 2D scan image. The optical measurement apparatus may measure critical dimensions of non-repeating ultrafine patterns at high speed.

Abstract translation: 根据示例实施例，光学测量装置可以包括：被配置为支持测量目标的站; 图像获取单元，被配置为获取所述测量对象的一维（1D）线图像; 驱动器，被配置为移动所述站和所述图像获取单元; 和控制器。 控制器可以被配置为控制驱动器和图像获取单元，以在改变图像获取单元和测量对象之间的距离的同时获取测量对象的多个1D线图像，以生成二维（2D）扫描图像 从组合多个1D线图像; 并且基于比较多个2D参考图像和2D扫描图像来检测测量对象的图案。 光学测量装置可以高速度地测量非重复超细纹图案的临界尺寸。

公开(公告)号：US20130208486A1

公开(公告)日：2013-08-15

申请号：US13762782

申请日：2013-02-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Won-Don JOO ,  Woo-Seok KO ,  Yu-Sin YANG ,  Sue-Jin CHO ,  Sang Don JANG ,  Byeong Hwan JEON

IPC: F21V13/04

CPC classification number: F21V13/04 ,  G01N21/8806 ,  G01N21/9501 ,  G03B2215/0582 ,  G03B2215/0592

Abstract: An illumination optic system includes a convex mirror to reflect light from a light source to towards a lens. The light source is at a first focus position and the lens is at a second focus position of the mirror. The system also includes a reflector to reflect light not incident on the lens toward the convex mirror. The reflector has a light guide hole to guide light to the incidence surface of the lens.

Abstract translation: 照明光学系统包括用于将来自光源的光反射到透镜的凸面镜。 光源处于第一焦点位置，并且透镜处于反射镜的第二焦点位置。 该系统还包括反射器，以将未入射到透镜的光反射到凸面镜。 反射器具有导光孔以将光引导到透镜的入射表面。

公开(公告)号：US20190181020A1

公开(公告)日：2019-06-13

申请号：US16018297

申请日：2018-06-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byeong Hwan JEON ,  Sang Ki NAM

IPC: H01L21/56 ,  H01L27/108 ,  H01L29/06 ,  H01L21/768

Abstract: There are provided a method of forming a nanorod structures and a method of forming a semiconductor device. The method of forming a semiconductor device may include forming a first seed pattern on a substrate; forming a first nanorod structure on the first seed pattern; and forming a molded structure surrounding a first lateral surface of the first nanorod structure while exposing a first upper surface of the first nanorod structure. The first nanorod structure may include a plurality of nanorods stacked sequentially on the first seed pattern. The plurality of nanorods may include a lowermost nanorod grown from the first seed pattern, and upper nanorods formed on the lowermost nanorod. The molded structure may include a lowermost molded layer surrounding a second lateral surface of the lowermost nanorod, and upper molded layers stacked sequentially on the lowermost molded layer. The upper molded layers may be formed of different materials.

公开(公告)号：US20130214180A1

公开(公告)日：2013-08-22

申请号：US13768762

申请日：2013-02-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Won Don JOO ,  Woo Seok KO ,  Yu Sin YANG ,  Sue Jin CHO ,  Sang Don JANG ,  Byeong Hwan JEON

IPC: F21V13/04 ,  F21V7/00

CPC classification number: F21V13/04 ,  F21V7/0025 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8845

Abstract: An optical system includes a first light source to radiate light in a first wavelength band, a reflector to reflect light from the first light source, a second light source to radiate light in a second wavelength band, and a reflector reflect the second light source. The fourth reflector is set at a first position to allow light from the first light source to each the condenser lens and set to a second position to allow light from the second light source to reach the condenser lens.

Abstract translation: 光学系统包括：第一光源，用于照射第一波长带中的光;反射器，用于反射来自第一光源的光;第二光源，用于辐射第二波长带中的光，反射器反射第二光源。 第四反射器被设置在第一位置以允许来自第一光源的光到每个聚光透镜并且被设置到第二位置，以允许来自第二光源的光到达聚光透镜。

公开(公告)号：US20200053860A1

公开(公告)日：2020-02-13

申请号：US16227080

申请日：2018-12-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byeong Hwan JEON

IPC: H05G2/00

Abstract: An extreme ultraviolet (EUV) generation device includes a housing module including a housing body whose inside is maintained in a vacuum state and an exit window formed on one side of the housing body, a laser source which emits lasers toward the inside of the housing body through the exit window, a plasma generation module which is located inside the housing body and generates plasma by allowing the lasers to be emitted toward a plasma gas, which flows into a laser focal area, and a radio frequency (RF) power supply module which preionizes the plasma gas before the plasma gas flows into the laser focal area.