公开(公告)号：US09846753B2

公开(公告)日：2017-12-19

申请号：US14215577

申请日：2014-03-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin-Young Lee ,  Chang-Ho Han

IPC: G06F17/50

CPC classification number: G06F17/5036 ,  G06F17/5009 ,  G06F2217/10

Abstract: In a simulation system and method thereof, the simulation includes, when a function value for a nominal point (NP) of an input is a first value, running a first simulation on the input; and when the function value for the NP of the input is a second value different from the first value, running a second simulation on the input. Here, the running of the second simulation may include (a) setting a boundary of an input distribution for the second value as a first distribution value, (b) generating input samples within the set boundary of the input distribution, (c) obtaining a worst case point (WCP) for the input by performing machine learning on the generated input samples, and (d) repeatedly performing the steps (a) to (c) while shifting the boundary of the input distribution until the boundary of the input distribution reaches a minimum critical value.

公开(公告)号：US09703280B2

公开(公告)日：2017-07-11

申请号：US14625907

申请日：2015-02-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Han-Hum Park ,  Sung-Won Choi ,  Chang-Ho Han

IPC: H01L21/02 ,  G05B19/402 ,  G03F7/20 ,  H01L21/66

CPC classification number: G05B19/402 ,  G03F7/70633 ,  G05B2219/45031 ,  H01L22/12 ,  H01L22/20

Abstract: A method for fabricating a semiconductor device includes obtaining first raw data by measuring an overlay of a semiconductor wafer of a first lot and generating a regression equation based on the first raw data. A semiconductor wafer of a second lot is aligned based on a coefficient of the regression equation, second raw data is obtained by measuring an overlay of the aligned semiconductor wafer of the second lot, and the regression equation is corrected based on the second raw data. Correction of the regression equation includes dividing the regression equation into an initial equation and a residual equation excluding the initial equation from the regression equation, correcting a coefficient of the initial equation; and correcting a coefficient of the residual equation.