公开(公告)号：US20240231228A1

公开(公告)日：2024-07-11

申请号：US18326617

申请日：2023-05-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Haengdeog Koh ,  Cheol Kang ,  Yoonhyun Kwak ,  Minsang Kim ,  Sunyoung Lee ,  Changheon Lee ,  Kyuhyun Im ,  Jungha Chae ,  Sunghyun Han

IPC: G03F7/038 ,  C08F12/30 ,  G03F7/004

CPC classification number: G03F7/0382 ,  C08F12/30 ,  G03F7/0045

Abstract: Provided are a resist composition and a method of forming a pattern using the same, the resist composition including an organometallic compound represented by Formula 1 below, and a polymer including a repeating unit represented by Formula 2 below:




wherein, in Formulas 1 and 2, M11, R11, R12, n, A21, L21 to L23, a21 to a23, R21 to R24, b22, p, and X21 are as described in the specification.