METHODS AND APPARATUSES FOR MEASURING VALUES OF PARAMETERS OF INTEGRATED CIRCUIT DEVICES
    1.
    发明申请
    METHODS AND APPARATUSES FOR MEASURING VALUES OF PARAMETERS OF INTEGRATED CIRCUIT DEVICES 审中-公开
    用于测量集成电路设备参数值的方法和装置

    公开(公告)号:US20150219446A1

    公开(公告)日:2015-08-06

    申请号:US14614646

    申请日:2015-02-05

    Abstract: Methods and apparatuses for measuring parameters of integrated circuit devices may be provided. The methods may include performing detecting operations on samples to obtain a set of data. Each detecting operation may include irradiating a light beam to the samples using a light irradiation part and detecting reflected light from the samples using a light detector. The samples may have values of a parameter different from one another. The method may also include obtaining a principal component based on the set of data and obtaining a regression model for the parameter using the principal component and values of the parameter of the samples.

    Abstract translation: 可以提供用于测量集成电路装置的参数的方法和装置。 这些方法可以包括对样本执行检测操作以获得一组数据。 每个检测操作可以包括使用光照射部分将光束照射到样品上,并使用光检测器检测来自样品的反射光。 样本可以具有彼此不同的参数的值。 该方法还可以包括基于该组数据获得主成分,并使用主要分量和样本参数的值获得参数的回归模型。

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