公开(公告)号：US11835447B1

公开(公告)日：2023-12-05

申请号：US18366835

申请日：2023-08-08

Applicant: AUROS TECHNOLOGY, INC.

Inventor： Tae Dong Kang

IPC: G01B11/28 ,  G01N21/21

CPC classification number: G01N21/211 ,  G01N2021/213 ,  G01N2201/126

Abstract: A method for measuring a characteristic of a thin film is disclosed. The method includes a) obtaining a measured spectrum from a target region on the substrate by using a spectroscopic ellipsometer, b) obtaining a physical model capable of obtaining an estimated parameter value related to the characteristic of the thin film through regression analysis of the measured spectrum, c) obtaining a machine learning model capable of obtaining a reference parameter value related to the characteristic of the thin film by using the measured spectrum, and d) obtaining an integrated model which uses an integrated error function capable of considering both of a first error function and a second error function, and obtaining an optimum parameter value through regression analysis of the integrated model.

公开(公告)号：US20230204422A1

公开(公告)日：2023-06-29

申请号：US17955881

申请日：2022-09-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinwoo Ahn ,  Juntaek Oh ,  Youngkyu Park ,  Eunsoo Hwang

IPC: G01J3/447 ,  G01N21/95 ,  G01N21/21 ,  G01J3/02

CPC classification number: G01J3/447 ,  G01N21/9501 ,  G01N21/211 ,  G01J3/021 ,  G01J3/0208 ,  G01N2021/213

Abstract: An imaging assembly of a spectral imaging ellipsometer includes an analyzer configured to polarize reflected light reflected from a sample surface, an imaging mirror optical system disposed on an optical path of the reflected light passing through the analyzer and including a first mirror having a concave surface and a second mirror having a convex surface, and a light detector configured to receive light passing through the imaging mirror optical system to collect spectral data. The reflected light is firstly reflected by the first mirror, the firstly reflected light is secondarily reflected by the second mirror and travels toward the first mirror again, and then thirdly reflected by the first mirror to be imaged on a light receiving surface of the light detector.

公开(公告)号：US20190212255A1

公开(公告)日：2019-07-11

申请号：US16226597

申请日：2018-12-19

Applicant: KLA-TENCOR CORPORATION

Inventor： Mark Allen Neil

IPC: G01N21/21 ,  G02B6/293 ,  G01B11/06

CPC classification number: G01J3/12 ,  G01B11/02 ,  G01B11/0625 ,  G01B11/14 ,  G01B2210/56 ,  G01J3/0202 ,  G01J3/027 ,  G01J3/0297 ,  G01J3/06 ,  G01J3/18 ,  G01J3/28 ,  G01J2003/1282 ,  G01N21/211 ,  G01N21/47 ,  G01N21/55 ,  G01N2021/213 ,  G01N2021/214 ,  G02B6/29314 ,  G03F7/70616

Abstract: Systems, methods, apparatuses, and articles of manufacture are provided for recovering a digitized spectrum and may comprise: an optical system configured to transform rays, the optical system including a diffraction grating, a steering mirror, a stage, and an actuator configured to move one of the stage, diffraction grating, or steering mirror according to a movement regime to vary an incidence of the rays on the stage; a sensor array disposed on the stage configured to receive the rays incident from the optical system at a plurality of measurement locations to obtain a plurality of ray spectra; and a processor electrically connected to the sensor array configured to receive the ray spectra, interleave the ray spectra to yield an interleaved spectrum, and deconvolve a point spread function corresponding to the optical system from the interleaved spectrum to yield a recovered digitized spectrum.

公开(公告)号：US10079183B2

公开(公告)日：2018-09-18

申请号：US14312568

申请日：2014-06-23

Applicant: KLA-Tencor Corporation

Inventor： Xiang Gao ,  Philip D. Flanner, III ,  Leonid Poslavsky ,  Ming Di ,  Qiang Zhao ,  Scott Penner

IPC: G01N21/21 ,  H01L21/66

CPC classification number: H01L22/12 ,  G01N21/211 ,  G01N2021/213 ,  H01L22/20

Abstract: Methods and systems of process control and yield management for semiconductor device manufacturing based on predictions of final device performance are presented herein. Estimated device performance metric values are calculated based on one or more device performance models that link parameter values capable of measurement during process to final device performance metrics. In some examples, an estimated value of a device performance metric is based on at least one structural characteristic and at least one band structure characteristic of an unfinished, multi-layer wafer. In some examples, a prediction of whether a device under process will fail a final device performance test is based on the difference between an estimated value of a final device performance metric and a specified value. In some examples, an adjustment in one or more subsequent process steps is determined based at least in part on the difference.

公开(公告)号：US10072921B2

公开(公告)日：2018-09-11

申请号：US14960121

申请日：2015-12-04

Applicant: KLA-Tencor Corporation

Inventor： Jiyou Fu ,  Noam Sapiens ,  Kevin A. Peterlinz ,  Stilian Ivanov Pandev

IPC: G01B11/24 ,  G01B11/00 ,  G03F7/00 ,  G01N21/956 ,  G01N21/21

CPC classification number: G01B11/002 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/00

Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.

公开(公告)号：US10018815B1

公开(公告)日：2018-07-10

申请号：US15932596

申请日：2018-03-19

Applicant: J. A. WOOLLAM CO., INC

Inventor： Martin M. Liphardt ,  Jeffrey S. Hale ,  Ping He ,  Galen L Pfeiffer

IPC: G02B17/00 ,  G01N21/21

CPC classification number: G02B17/004 ,  G01N21/211 ,  G01N2021/213 ,  G01N2201/0636 ,  G01N2201/12746 ,  G02B17/0621 ,  G02B17/0663 ,  G02B19/0023 ,  G02B19/0076

Abstract: A method of applying a reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved.

公开(公告)号：US09921395B1

公开(公告)日：2018-03-20

申请号：US15530014

申请日：2016-11-18

Applicant: J.A. WOOLLAM CO., INC

Inventor： Martin M. Liphardt ,  Jeffrey S. Hale ,  Ping He ,  Galen L. Pfeiffer

IPC: G02B17/06 ,  G02B27/00 ,  G01N21/21

CPC classification number: G02B17/0663 ,  G01J1/0411 ,  G01J1/0414 ,  G01J4/00 ,  G01N21/21 ,  G01N21/211 ,  G01N2021/213 ,  G01N2201/0636 ,  G02B17/0621 ,  G02B19/0023 ,  G02B27/0012 ,  G02B27/0983

Abstract: A reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved. This invention is also a combination of a focusing element and a filtering element that provides an optimum electromagnetic beam cross-sectional area based on optimizing the beam cross-sectional area in view of conflicting effects of aberration and diffraction inherent in said focusing element, which, for each wavelength, vary oppositely to one another with electromagnetic beam cross-sectional area.

公开(公告)号：US20160341670A1

公开(公告)日：2016-11-24

申请号：US14720644

申请日：2015-05-22

Applicant: Nanometrics Incorporated

Inventor： Pedro Vagos

IPC: G01N21/88 ,  G01N21/55 ,  G01N21/21

CPC classification number: G01N21/8851 ,  G01N21/211 ,  G01N21/55 ,  G01N2021/213 ,  G01N2021/8896 ,  G03F7/70625

Abstract: Parameters of a sample are measured using a model-based approach that utilizes the difference between experimental spectra acquired from the sample and experimental anchor spectra acquired from one or more reference samples at the same optical metrology tool. Anchor parameters of the one or more reference samples are determined using one or more reference optical metrology tools. The anchor spectrum is obtained and the target spectrum for the sample is acquired using the optical metrology tool. A differential experimental spectrum is generated based on a difference between the target spectrum and the anchor spectrum. The parameters for the sample are determined using the differential experimental spectrum and the anchor parameters, e.g., by comparing the differential experimental spectrum to a differential simulated spectrum, which is based on a difference between spectra simulated using a model having the parameters and a spectrum simulated using a model having the anchor parameters.

Abstract translation: 使用基于模型的方法测量样品的参数，该方法利用从样品获得的实验光谱与在相同光学计量学工具中从一个或多个参考样品获得的实验锚图谱之间的差异。 使用一个或多个参考光学测量工具确定一个或多个参考样本的锚参数。 获得锚定谱，并使用光学计量学工具获取样品的目标光谱。 基于目标光谱和锚谱之间的差异产生差分实验光谱。 使用差分实验光谱和锚参数来确定样品的参数，例如通过将差示实验光谱与差示模拟光谱进行比较，其基于使用具有参数的模型和光谱模拟模拟的光谱之间的差异 使用具有锚参数的模型。

公开(公告)号：US09470639B1

公开(公告)日：2016-10-18

申请号：US15014987

申请日：2016-02-03

Applicant: KLA-Tencor Corporation

Inventor： Guorong V. Zhuang ,  Shankar Krishnan ,  Lanhua Wei ,  Walter Mieher ,  Paul Aoyagi

IPC: G01J4/00 ,  G01N21/95 ,  G01N21/21 ,  G01N21/25

CPC classification number: G01N21/9501 ,  G01B11/0625 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/255 ,  G01N2021/213 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/12 ,  G03F7/70625

Abstract: Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to grating anomalies are presented herein. A reduction in sensitivity to grating anomalies is achieved by selecting a subset of available system parameter values for measurement analysis. The reduction in sensitivity to grating anomalies enables an optimization of any combination of precision, sensitivity, accuracy, system matching, and computational effort. These benefits are particularly evident in optical metrology systems having large ranges of available azimuth angle, angle of incidence, illumination wavelength, and illumination polarization. Predictions of grating anomalies are determined based on a measurement model that accurately represents the interaction between the measurement system and the periodic metrology target under measurement. A subset of available system parameter values is selected to reduce the impact of grating anomalies on measurement results. The selected subset of available system parameters is implemented on a configurable spectroscopic metrology system performing measurements.

Abstract translation: 本文介绍了对光栅异常灵敏度降低的宽带光谱测量方法和系统。 通过选择用于测量分析的可用系统参数值的子集来实现对光栅异常的灵敏度的降低。 对光栅异常的灵敏度的降低使得能够优化精度，灵敏度，精度，系统匹配和计算工作的任何组合。 在具有大范围的可用方位角，入射角，照明波长和照明偏振的光学测量系统中，这些益处特别明显。 基于精确表示测量系统和测量周期测量目标之间的相互作用的测量模型，确定光栅异常预测。 选择可用系统参数值的一个子集来减少光栅异常对测量结果的影响。 所选择的可用系统参数的子集在执行测量的可配置光谱计量系统上实现。

公开(公告)号：US09442063B2

公开(公告)日：2016-09-13

申请号：US13524053

申请日：2012-06-15

Applicant: Ming Di ,  Torsten Kaack ,  Qiang Zhao ,  Xiang Gao ,  Leonid Poslavsky

Inventor： Ming Di ,  Torsten Kaack ,  Qiang Zhao ,  Xiang Gao ,  Leonid Poslavsky

IPC: G01N21/21 ,  G01N21/84

CPC classification number: G01N21/211 ,  G01N21/8422 ,  G01N2021/213

Abstract: The present invention includes generating a three-dimensional design of experiment (DOE) for a plurality of semiconductor wafers, a first dimension of the DOE being a relative amount of a first component of the thin film, a second dimension of the DOE being a relative amount of a second component of the thin film, a third dimension of the DOE being a thickness of the thin film, acquiring a spectrum for each of the wafers, generating a set of optical dispersion data by extracting a real component (n) and an imaginary component (k) of the complex index of refraction for each of the acquired spectrum, identifying one or more systematic features of the set of optical dispersion data; and generating a multi-component Bruggeman effective medium approximation (BEMA) model utilizing the identified one or more systematic features of the set of optical dispersion data.

Abstract translation: 本发明包括生成多个半导体晶片的实验（DOE）的三维设计，DOE的第一维度是薄膜的第一分量的相对量，DOE的第二维度是相对的 量的第二分量，DOE的第三维度是薄膜的厚度，获取每个晶片的光谱，通过提取实数分量（n）和产生一组光散射数据 用于识别所述光学色散数据集合中的一个或多个系统特征的每个所获取的光谱的复折射率的虚分量（k）; 以及使用所述一组或多个光学色散数据的一个或多个系统特征来生成多分量Bruggeman有效中等近似（BEMA）模型。