公开(公告)号：US20010028378A1

公开(公告)日：2001-10-11

申请号：US09790714

申请日：2001-02-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-sung Lee ,  Hyun-cheol Kim ,  Yong-soo Oh ,  Cimoo Song

IPC: B41J002/05

CPC classification number: B41J2/1433 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1642

Abstract: A monolithic nozzle assembly for fluid, and a method for manufacturing the same with a single mono-crystalline silicon wafer by continuous self-alignment are provided. The monolithic nozzle assembly can be formed with a single (100) monocrystalline silicon wafer. Compared with a complicated nozzle assembly formed using a great number of silicon wafers and plates, the configuration of the monolithic nozzle assembly is simple, and can be manufactured on a mass production scale by semiconductor manufacturing processes. The monolithic nozzle assembly can be manufactured by continuous self-alignment, including anisotropic etching using the characteristic of the crystal plane of silicon, and LOCOS-based masking. Compared with a common photolithography process, the alignment error may be reduced below a few microns. The overall manufacturing process is simple and efficient with a high yield.

Abstract translation: 提供了用于流体的单片式喷嘴组件及其通过连续自对准用单个单晶硅晶片制造该方法。 单片喷嘴组件可以由单个（100）单晶硅晶片形成。 与使用大量硅晶片和板形成的复杂喷嘴组件相比，单片喷嘴组件的构造简单，并且可以通过半导体制造工艺在大规模生产规模上制造。 单片喷嘴组件可以通过连续自对准（包括使用硅的晶面的特性的各向异性蚀刻）和基于LOCOS的掩模来制造。 与普通光刻工艺相比，对准误差可能会降低到几微米以下。 整体制造工艺简单高效，成品率高。