公开(公告)号：US20230008927A1

公开(公告)日：2023-01-12

申请号：US17543168

申请日：2021-12-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jin Soo KIM ,  Myung Beom PARK ,  Dong-Min KANG ,  Sam Jong CHOI

IPC: F25J3/02 ,  C01B32/50 ,  G01N1/22 ,  G01N33/00

Abstract: A system and a method for reusing carbon dioxide are provided. The system includes: a process apparatus configured to discharge exhaust gas containing carbon dioxide therefrom; a purifying device configured to purify the exhaust gas, and thus produce reused carbon dioxide from the exhaust gas and store the produced reused carbon dioxide; a first supply tank configured to receive the reused carbon dioxide from the purifying device; a second supply tank configured to receive the reused carbon dioxide from the first supply tank and provide the reused carbon dioxide to the process apparatus; and a blocking device configured to, based on determining that a purity of the reused carbon dioxide provided from the purifying device to the first supply tank fails to satisfy a predefined reference, block flow of the reused carbon dioxide from the purifying device to the first supply tank.

公开(公告)号：US20160137953A1

公开(公告)日：2016-05-19

申请号：US14942206

申请日：2015-11-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ahn-Ho LEE ,  Chung-Kyung JUNG ,  Dong-Min KANG ,  Dong-Hun KANG ,  Go-Un KIM ,  Dong-Jin KIM ,  Yong-Sik YOO ,  Young-Chul JUNG ,  Yu-Ri JUNG ,  Jung-Min CHOI ,  Sang-Kyun KIM

IPC: C11D1/00 ,  C11D3/30 ,  C11D11/00 ,  C11D3/20

CPC classification number: C11D1/008 ,  C11D1/662 ,  C11D1/667 ,  C11D1/72 ,  C11D3/2079 ,  C11D3/28 ,  C11D3/30 ,  C11D3/43 ,  C11D11/0047

Abstract: A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.

Abstract translation: 清洁组合物包括有机溶剂，有机酸，螯合剂，末端含有至少一个羟基（OH）的表面活性剂和超纯水，其中清洗组合物的pH值等于或等于 超过12。