Semiconductor Devices Including Guard Ring Structures
    1.
    发明申请
    Semiconductor Devices Including Guard Ring Structures 有权
    包括护环结构的半导体器件

    公开(公告)号:US20130248997A1

    公开(公告)日:2013-09-26

    申请号:US13787147

    申请日:2013-03-06

    CPC classification number: H01L27/088 H01L21/823456 H01L21/823481

    Abstract: A semiconductor device includes a substrate partitioned into a cell region, a peripheral circuit region, and an interface region between the cell region and the peripheral circuit region. A guard ring is provided in the interface region of the substrate and surrounds the cell region. A first gate structure is in the cell region, and a second gate structure is in the peripheral circuit region.

    Abstract translation: 半导体器件包括分隔成单元区域的基板,外围电路区域和单元区域与外围电路区域之间的接口区域。 保护环设置在基板的界面区域中并围绕单元区域。 第一栅极结构在单元区域中,第二栅极结构在外围电路区域中。

    Semiconductor devices including guard ring structures
    2.
    发明授权
    Semiconductor devices including guard ring structures 有权
    半导体器件包括保护环结构

    公开(公告)号:US08928073B2

    公开(公告)日:2015-01-06

    申请号:US13787147

    申请日:2013-03-06

    CPC classification number: H01L27/088 H01L21/823456 H01L21/823481

    Abstract: A semiconductor device includes a substrate partitioned into a cell region, a peripheral circuit region, and an interface region between the cell region and the peripheral circuit region. A guard ring is provided in the interface region of the substrate and surrounds the cell region. A first gate structure is in the cell region, and a second gate structure is in the peripheral circuit region.

    Abstract translation: 半导体器件包括分隔成单元区域的基板,外围电路区域和单元区域与外围电路区域之间的接口区域。 保护环设置在基板的界面区域中并围绕单元区域。 第一栅极结构在单元区域中,第二栅极结构在外围电路区域中。

Patent Agency Ranking