公开(公告)号：US20220282372A1

公开(公告)日：2022-09-08

申请号：US17543807

申请日：2021-12-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaeheung LEE ,  Junseong PARK ,  Kanghun LEE ,  Seongwan KIM ,  Hyouncheol KIM

IPC: C23C16/455 ,  C23C16/52 ,  H01L21/67

Abstract: A vacuum valve includes a valve flange having a first port, a second port, and a valve seat in a space between the first port and the second port, a valve body in the valve flange, the valve body having a contact surface facing the valve seat, and the valve body being moveable to have the contact surface contact the valve seat and to be separated from the valve seat, a disk on the contact surface of the valve body, the disk having an inclined surface inclined toward the second port, and an actuator connected to the valve flange, the actuator being configured to apply a driving force to the valve body to move the contact surface of the valve body into or out of contact with the valve seat.

公开(公告)号：US20250162000A1

公开(公告)日：2025-05-22

申请号：US18658495

申请日：2024-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Woong LEE ,  Giduck KWEON ,  Taewoo KIM ,  Ha-Sung KIM ,  Hyouncheol KIM ,  Hanearl JUNG ,  Ahjin CHO ,  Chin Moo CHO ,  Wooyeon HWANG

IPC: B08B9/032

Abstract: A substrate processing apparatus cleaning method includes: inserting a boat into a process tube; removing, by performing a first removal process, a first material deposited in the process tube; and removing, by performing a second removal process, a second material deposited in the process tube by the first removal process, wherein the first removal process includes supplying the process tube with a first gas, wherein the second removal process includes supplying the process tube with a second gas, wherein one of the first gas and the second gas includes a chlorine-based gas, and wherein the other of the first gas and the second gas includes a fluorine-based gas.