POST BAKING APPARATUS
    2.
    发明公开

    公开(公告)号:US20240192604A1

    公开(公告)日:2024-06-13

    申请号:US18216028

    申请日:2023-06-29

    CPC classification number: G03F7/40

    Abstract: A post baking apparatus comprising a baking chamber configured to receive a substrate with an exposed photoresist film, a lower heater in the baking chamber under the substrate to heat the exposed photoresist film, an applier applying an electric field or a magnetic field to the exposed photoresist film along a vertical direction, which is substantially perpendicular to an upper surface of the exposed photoresist film, to control diffusions of an acid or a secondary electron, which are generated from the exposed photoresist film, along a horizontal direction, and a controller configured to control an operation of the applier.

    Electronic Device Including Tactile Sensor, Operating Method Thereof, and System
    3.
    发明申请
    Electronic Device Including Tactile Sensor, Operating Method Thereof, and System 审中-公开
    电子设备包括触觉传感器,其操作方法和系统

    公开(公告)号:US20160124603A1

    公开(公告)日:2016-05-05

    申请号:US14928426

    申请日:2015-10-30

    Abstract: Embodiments of the present disclosure relate to an electronic device including a tactile sensor, an operating method thereof, and a system. The electronic device may include: at least one tactile sensor that is located on a side of the electronic device and provides a sense of touch; a display unit that displays content; and a controller that controls the at least one tactile sensor to provide a sense of touch relevant to the content.

    Abstract translation: 本公开的实施例涉及一种包括触觉传感器,其操作方法和系统的电子设备。 电子设备可以包括:位于电子设备侧面并提供触觉的至少一个触觉传感器; 显示内容的显示单元; 以及控制器,其控制所述至少一个触觉传感器以提供与所述内容相关的触摸感。

    SUBSTRATE SUPPORTING MEMBER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20250031281A1

    公开(公告)日:2025-01-23

    申请号:US18389721

    申请日:2023-12-19

    Abstract: A substrate supporting member and a substrate processing apparatus including the same are provided. The substrate supporting member includes a plate having at least one heating zone. A heating member is on a first surface of the plate and located in the at least one heating zone. The heating member extends along a circumferential direction of the plate and is configured to heat a substrate supported by the plate. A first electrode is on the first surface of the plate and is connected to an inner side surface of the heating member. A second electrode is on the first surface of the plate and is connected to an outer side surface of the heating member. The heating member has a stair-step configuration such that a thickness of the heating member increases from the second electrode toward the first electrode.

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