公开(公告)号：US20160109172A1

公开(公告)日：2016-04-21

申请号：US14885551

申请日：2015-10-16

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Dae Whan KIM ,  Keon KUK ,  Tae-Ho SONG ,  Sung-Kie YOUN ,  Kang WONKYEONG ,  Pilseong KANG ,  Yeo INSEOK ,  Jaehyug LEE ,  Gil-Eon JEONG ,  Choi BONGSU

IPC: F25D23/06 ,  F25D25/00

CPC classification number: F25D23/065 ,  F25D23/063 ,  F25D25/00 ,  F25D2201/14

Abstract: Disclosed herein is a refrigerator which has an improved structure to increase insulating properties. The refrigerator includes a body including an inner casing and an outer casing, a storage compartment formed in the inner casing, an insulator provided between the inner casing and the outer casing to insulate the storage compartment, and a frame unit which is disposed between the adjacent insulators to ensure stiffness of the body and includes at least one coupling surface coupled with at least one of the inner casing and the outer casing.

Abstract translation: 本文公开了一种具有改进的结构以提高绝缘性能的冰箱。 冰箱包括：主体，包括内壳和外壳;存储室，形成在所述内壳中;绝缘体，设置在所述内壳和所述外壳之间以使所述储藏室绝缘;以及框架单元， 绝缘体以确保主体的刚度并且包括与内壳体和外壳体中的至少一个联接的至少一个联接表面。

公开(公告)号：US20230131040A1

公开(公告)日：2023-04-27

申请号：US17825449

申请日：2022-05-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jaehyug LEE ,  Chae Lyoung KIM ,  Hoyoung KIM ,  Seungjun LEE

IPC: B24B37/04 ,  B24B37/07

Abstract: Disclosed are substrate polishing apparatuses, substrate polishing systems, and/or substrate polishing methods. The substrate polishing apparatus may include an electric field applying module, and a platen that rotates a polishing pad. The electric field applying module may include an inner electrode having a circular shape when viewed in plan. The platen may be on the inner electrode. A central axis of the inner electrode may be spaced apart from a central axis of the platen. The inner electrode may include a first electrode and a second electrode that may surround the first electrode and may have an annular shape.