公开(公告)号：US11562477B2

公开(公告)日：2023-01-24

申请号：US17189893

申请日：2021-03-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minho Kim ,  Hakseung Han ,  Jiyoung Kim ,  Jinback Park

IPC: G06K9/00 ,  G06T7/00 ,  G02B27/14 ,  G01N21/95

Abstract: An apparatus and method of measuring pattern uniformity, and a method of manufacturing a mask by using the measurement method are provided. The measurement apparatus includes a light source configured to generate and output light, a stage configured to support a measurement target, an optical system configured to transfer the light, output from the light source, to the measurement target supported on the stage, and a first detector configured to detect light reflected and diffracted by the measurement target, or diffracted by passing through the measurement target, wherein the first detector is configured to detect a pupil image of a pupil plane and to measure pattern uniformity of an array area of the measurement target on the basis of intensity of at least one of zero-order light and 1st-order light of the pupil image.

公开(公告)号：US12260539B2

公开(公告)日：2025-03-25

申请号：US18093030

申请日：2023-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minho Kim ,  Hakseung Han ,  Jiyoung Kim ,  Jinback Park

IPC: G06K9/00 ,  G01N21/95 ,  G02B27/14 ,  G06T7/00

Abstract: An apparatus and method of measuring pattern uniformity, and a method of manufacturing a mask by using the measurement method are provided. The measurement apparatus includes a light source configured to generate and output light, a stage configured to support a measurement target, an optical system configured to transfer the light, output from the light source, to the measurement target supported on the stage, and a first detector configured to detect light reflected and diffracted by the measurement target, or diffracted by passing through the measurement target, wherein the first detector is configured to detect a pupil image of a pupil plane and to measure pattern uniformity of an array area of the measurement target on the basis of intensity of at least one of zero-order light and 1st-order light of the pupil image.

公开(公告)号：US20230142328A1

公开(公告)日：2023-05-11

申请号：US18093030

申请日：2023-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minho Kim ,  Hakseung Han ,  Jiyoung Kim ,  Jinback Park

IPC: G06T7/00 ,  G02B27/14 ,  G01N21/95

CPC classification number: G06T7/0006 ,  G02B27/14 ,  G01N21/9501 ,  G06T2207/30148

Abstract: An apparatus and method of measuring pattern uniformity, and a method of manufacturing a mask by using the measurement method are provided. The measurement apparatus includes a light source configured to generate and output light, a stage configured to support a measurement target, an optical system configured to transfer the light, output from the light source, to the measurement target supported on the stage, and a first detector configured to detect light reflected and diffracted by the measurement target, or diffracted by passing through the measurement target, wherein the first detector is configured to detect a pupil image of a pupil plane and to measure pattern uniformity of an array area of the measurement target on the basis of intensity of at least one of zero-order light and 1st-order light of the pupil image.

公开(公告)号：US20220012871A1

公开(公告)日：2022-01-13

申请号：US17189893

申请日：2021-03-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minho Kim ,  Hakseung Han ,  Jiyoung Kim ,  Jinback Park

IPC: G06T7/00 ,  G01N21/95 ,  G02B27/14

Abstract: An apparatus and method of measuring pattern uniformity, and a method of manufacturing a mask by using the measurement method are provided. The measurement apparatus includes a light source configured to generate and output light, a stage configured to support a measurement target, an optical system configured to transfer the light, output from the light source, to the measurement target supported on the stage, and a first detector configured to detect light reflected and diffracted by the measurement target, or diffracted by passing through the measurement target, wherein the first detector is configured to detect a pupil image of a pupil plane and to measure pattern uniformity of an array area of the measurement target on the basis of intensity of at least one of zero-order light and 1st-order light of the pupil image.