SEMICONDUCTOR DEVICE
    1.
    发明申请

    公开(公告)号:US20230014468A1

    公开(公告)日:2023-01-19

    申请号:US17691293

    申请日:2022-03-10

    Abstract: A semiconductor device includes a substrate including a first active fin and a second active fin respectively extending in a first direction, the substrate having a recess between the first and second active fins, a device isolation film on the substrate, first and second gate structures on the first and second active fins, respectively, and extending in a second direction, and a field separation layer having a first portion between the first and second active fin and in the recess, and a second portion extending from both sides of the first portion in the second direction to an upper surface of the device isolation film. The recess has a bottom surface lower in a third direction intersecting the first direction and the second direction than the upper surface of the device isolation film, and a region of the upper surface of the device isolation film has a flat surface.

    PRESSURE GAUGE ZERO POINT CALIBRATION METHOD

    公开(公告)号:US20250076144A1

    公开(公告)日:2025-03-06

    申请号:US18820787

    申请日:2024-08-30

    Abstract: A pressure gauge zero point calibration method of a pressure gauge having a diaphragm includes performing a first external zero point calibration at a first time, performing a second external zero point calibration at a second time, the second time occurring after the first time, generating a first usage during a first zero point interval, the first zero point interval spanning from the first time to the second time, determining a usage-based offset slope by dividing a zero point offset difference by the first usage, generating a second usage during a second zero point interval, the second zero point interval spanning from the second time to a third time, the third time occurring after the second time, obtaining a third zero point offset based on the usage-based offset slope and the second usage, and applying the third zero point offset to the pressure gauge, the pressure gauge having a diaphragm.

    SUBSTRATE PROCESSING APPARATUS
    4.
    发明申请

    公开(公告)号:US20210296153A1

    公开(公告)日:2021-09-23

    申请号:US17189392

    申请日:2021-03-02

    Abstract: A substrate processing apparatus including an electrostatic chuck on which a substrate is mountable; a ring surrounding the electrostatic chuck, the ring including a first coupling groove; and a first floating electrode in the first coupling groove of the ring, the first floating electrode having a ring shape, wherein a top surface of the first floating electrode is exposed at the ring, and the first floating electrode has a tapered shape including an inclined surface that is inclined in a downward direction toward the electrostatic chuck.

    APPARATUS AND METHOD OF PROCESSING BIOSIGNAL

    公开(公告)号:US20250082217A1

    公开(公告)日:2025-03-13

    申请号:US18884994

    申请日:2024-09-13

    Abstract: A biosignal processing method includes receiving a biosignal from a sensor, performing first signal processing based on variable frequency complex demodulation (VFCDM) on the biosignal, performing, once or more, second signal processing based on the VFCDM on a periodic signal having an instantaneous frequency as a center frequency, the instantaneous frequency being calculated based on the first signal processing, and estimating bio-information, based on at least one processing signal calculated based on the second signal processing performed once or more.

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