公开(公告)号：US20240152062A1

公开(公告)日：2024-05-09

申请号：US18354207

申请日：2023-07-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sukjong Bae ,  Kangho Park ,  Moongu Shin ,  Myoungsoo Lee ,  Hojune Lee

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/2004 ,  G03F7/70075 ,  G03F7/70758 ,  G03F7/70825 ,  G03F7/7085

Abstract: A mask exposure system includes a chamber, a stage configured to receive a mask, one or more mask temperature sensors, a beam source configured to irradiate an electron beam on the mask, a deflector configured to adjust a position at which the electron beam is irradiated on the mask by deflecting the electron beam based on a voltage level applied to the deflector, in the chamber, a chamber temperature sensor configured to measure an internal temperature of the chamber, and a controller configured to control a direction of deflection and a degree of deflection of the electron beam the deflector. The controller is configured to correct the voltage level applied to the deflector based on a difference between the temperature of the mask and the chamber.

公开(公告)号：USD859390S1

公开(公告)日：2019-09-10

申请号：US29614543

申请日：2017-08-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Designer： Byunglyul Park ,  Kangho Park ,  Bora Han ,  Sehan Kim ,  Yoonha Paick ,  Bongkyu Song ,  Ilwoo Lee ,  Jihye Lee