公开(公告)号：US10541182B2

公开(公告)日：2020-01-21

申请号：US15887186

申请日：2018-02-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yeon-tae Kim ,  Do-hyung Kim ,  Kwang-hyun Yang ,  Chang-yun Lee ,  Young-uk Choi ,  Kee-soo Park ,  Eun-sok Choi

IPC: G01N21/95 ,  G01N21/88 ,  H01L21/66 ,  H01L21/687 ,  G01B11/24 ,  G01B11/06 ,  G01N21/55 ,  H01L21/67

Abstract: A method of inspecting a semiconductor substrate includes measuring light intensity of light reflected on the rotating semiconductor substrate, analyzing a frequency distribution of the measured light intensity, and determining a state of the semiconductor substrate by using the frequency distribution. The analyzing of the frequency distribution of the measured light intensity includes extracting a plurality of frequency components corresponding respectively to a plurality of frequencies from the measured light intensity.