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公开(公告)号:US20230240074A1
公开(公告)日:2023-07-27
申请号:US18129145
申请日:2023-03-31
Applicant: Samsung Electronics Co., Ltd.
Inventor: SEONG-HUN JEONG , BYOUNGIL LEE , JOONHEE LEE
CPC classification number: H10B43/27 , H01L23/528 , H10B41/10 , H10B41/27 , H10B41/40 , H10B43/10 , H10B43/40
Abstract: A semiconductor device includes a substrate including a lower horizontal layer and an upper horizontal layer and having a cell array region and a connection region, an electrode structure including electrodes, which are stacked above the substrate, and which extend from the cell array region to the connection region, a vertical channel structure on the cell array region that penetrates the electrode structure and is connected to the substrate, and a separation structure on the connection region that penetrates the electrode structure. The lower horizontal layer has a first top surface in contact with a first portion of the separation structure, and a second top surface in contact with a second portion of the separation structure, and an inflection point at which a height of the lower horizontal layer is abruptly changed between the first top surface and the second top surface.
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公开(公告)号:US20210272981A1
公开(公告)日:2021-09-02
申请号:US17035970
申请日:2020-09-29
Applicant: Samsung Electronics Co., Ltd.
Inventor: SEONG-HUN JEONG , BYOUNGIL LEE , JOONHEE LEE
IPC: H01L27/11582 , H01L27/11556 , H01L27/11565 , H01L27/11519 , H01L27/11526 , H01L27/11573 , H01L23/528
Abstract: A semiconductor device includes a substrate including a lower horizontal layer and an upper horizontal layer and having a cell array region and a connection region, an electrode structure including electrodes, which are stacked above the substrate, and which extend from the cell array region to the connection region, a vertical channel structure on the cell array region that penetrates the electrode structure and is connected to the substrate, and a separation structure on the connection region that penetrates the electrode structure. The lower horizontal layer has a first top surface in contact with a first portion of the separation structure, and a second top surface in contact with a second portion of the separation structure, and an inflection point at which a height of the lower horizontal layer is abruptly changed between the first top surface and the second top surface.
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