公开(公告)号：US11372322B2

公开(公告)日：2022-06-28

申请号：US17142704

申请日：2021-01-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ho Yeon Kim ,  Seong Chui Hong ,  Seong Sue Kim

IPC: G03F1/22 ,  G03F1/24 ,  G03F1/52 ,  G03F1/54 ,  G03F1/58 ,  H01L21/027

Abstract: An extreme ultraviolet (EUV) mask blank is provided. The EUV mask blank includes a substrate having a first surface and a second surface opposed to each other, a reflective layer having first reflective layers and second reflective layers alternately stacked on the first surface of the substrate, a capping layer on the reflective layer, and a hydrogen absorber layer between the reflective layer and the capping layer, the hydrogen absorber layer configured to store hydrogen and being in contact with the capping layer.

公开(公告)号：US10915015B2

公开(公告)日：2021-02-09

申请号：US16225915

申请日：2018-12-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ho Yeon Kim ,  Seong Chul Hong ,  Seong Sue Kim

IPC: G03F1/22 ,  G03F1/58 ,  G03F1/24 ,  G03F1/52 ,  G03F1/54 ,  H01L21/027

Abstract: An extreme ultraviolet (EUV) mask blank is provided. The EUV mask blank includes a substrate having a first surface and a second surface opposed to each other, a reflective layer having first reflective layers and second reflective layers alternately stacked on the first surface of the substrate, a capping layer on the reflective layer, and a hydrogen absorber layer between the reflective layer and the capping layer, the hydrogen absorber layer configured to store hydrogen and being in contact with the capping layer.

公开(公告)号：US10338477B2

公开(公告)日：2019-07-02

申请号：US15674129

申请日：2017-08-10

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Do Hyung Kim ,  Seong Sue Kim

IPC: G03F7/20 ,  G03F1/38

Abstract: A lithography apparatus is provided. The lithography apparatus a reticle having a first surface and a second surface facing each other, and a pattern region formed on the first surface, a reticle stage facing the second surface of the reticle, the reticle stage to chuck the reticle, a protection conductor within a chamber housing the reticle and the reticle stage; and a power source to supply a voltage to the protection conductor.