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1.发明授权Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device 有权光掩模，校正误差的方法，使用光掩模制造的集成电路器件以及集成电路器件的制造方法公开(公告)号：US09588413B2
公开(公告)日：2017-03-07
申请号：US15258163
申请日：2016-09-07
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sang-hyun Kim , Seong-sue Kim , Dong-gun Lee
Abstract: Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.
Abstract translation: 提供一种光掩模和一种校正其错误的方法。 光掩模包括覆盖基板的一个侧表面的多层反射膜和覆盖基板的另一侧表面的能量接收层。 该方法包括根据检测到的光掩模误差确定光掩模的前表面上的局部校正位置，并将能量束局部地施加到与沿局部校正位置的局部校正位置对准的光掩模的背侧表面区域 光掩模 本发明可以应用于受到表面高度的改变或选择性施加的应力的光掩模以外的结构的影响。
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2.发明授权Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device 有权光掩模，校正误差的方法，使用光掩模制造的集成电路器件以及集成电路器件的制造方法公开(公告)号：US09465286B2
公开(公告)日：2016-10-11
申请号：US14565087
申请日：2014-12-09
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sang-hyun Kim , Seong-sue Kim , Dong-gun Lee
Abstract: Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.
Abstract translation: 提供一种光掩模和一种校正其错误的方法。 光掩模包括覆盖基板的一个侧表面的多层反射膜和覆盖基板的另一侧表面的能量接收层。 该方法包括根据检测到的光掩模的误差来确定光掩模的前表面上的局部校正位置，并且将能量束局部地施加到与沿局部校正位置的厚度方向对齐的光掩模的背面表面区域 光掩模 本发明可以应用于受到表面高度的改变或选择性施加的应力的光掩模以外的结构的影响。
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