公开(公告)号：US10067067B2

公开(公告)日：2018-09-04

申请号：US15203317

申请日：2016-07-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seongsil Lee ,  Jeongho Ahn

IPC: G01N21/88 ,  G01N21/47 ,  G01N21/956

Abstract: A substrate inspection apparatus may include a light source, which is configured to emit an incident light. The substrate inspection apparatus may further include a support, a detector, and a light adjuster. The supporting base configured to support a substrate, the detector configured to detect a defect on the substrate, and the light adjuster configured to allow the incident light to be reflected. The detector may be configured to collect a scattering signal. The scattering signal is generated from an optical interaction between an evanescent wave and the defect on the substrate, and to detect the defect. The evanescent wave may be generated when the incident light is totally and/or substantially reflected by the light adjuster.

公开(公告)号：US20250027875A1

公开(公告)日：2025-01-23

申请号：US18775796

申请日：2024-07-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jinwoo Lee ,  Seungryeol Oh ,  Hidong Kwak ,  Jeongho Ahn ,  Seongsil Lee ,  Suyoung Lee ,  Hyeongcheol Lee

IPC: G01N21/31

Abstract: An optical imaging device includes a pulse generator including a pulse generating device configured to generate pulse lasers and a pulse expander configured to receive a pulse laser from the pulse generating device, and generate a broadened pulse laser by expanding a spectrum and width of the received pulse laser, an optical assembly including an objective lens configured to receive the broadened pulse laser and pass the received broadened pulse laser to a target object, and a light receiver including a light receiving device configured to receive a reflected pulse laser corresponding to the broadened pulse laser reflected from the target object and convert the reflected pulse laser into an electrical signal, and at least one processor configured to generate a spectral image set based on the electrical signal generated by the light receiving device.

公开(公告)号：US10393672B2

公开(公告)日：2019-08-27

申请号：US15959347

申请日：2018-04-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jeongho Ahn ,  Jae-Man Oh ,  Seongsil Lee ,  Yusin Yang ,  Dongchul Ihm ,  Hyungsuk Cho

IPC: G02B21/00 ,  G01N21/95 ,  G01N21/88 ,  G01N21/956 ,  G11C29/02 ,  H01J37/28 ,  H01J37/26 ,  G11C29/04

Abstract: A substrate inspection system includes a substrate support, optics configured to irradiate a patterned structure on the substrate and capture images of the patterned structure from light reflected from the patterned structure, a focus adjustment operative to adjust a focal position of the incident light on the patterned structure, and an image processor configured to calculate an optimal value of a focus offset used to establish focal points of the light for defect detection in the patterned structure. The patterned structure may include a first pattern having an opening and a second pattern having top surfaces located at different heights relative to the substrate. The value of the focus offset is determined using images of the top surfaces of the second pattern obtained while changing the focal position of the incident light.