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公开(公告)号：US09542740B2
公开(公告)日：2017-01-10
申请号：US14331899
申请日：2014-07-15
Applicant: Samsung Electronics Co., Ltd.
Inventor： Ki-Hyun Kim , Kai-Yuan Chi , Dmitry Vengertsev , Seung-Hune Yang
CPC classification number: G06T7/001 , G06T2207/10061 , G06T2207/30148
Abstract: Provided is a method of detecting a defect of a pattern using vectorization to increase accuracy and efficiency in OPC modeling and OPC verification. The method includes acquiring a target layout image associated with a target pattern, acquiring a pattern image associated with a pattern formed on a substrate, extracting an edge image from the pattern image, producing a first vector form based on the target layout image, producing a second vector form based on the edge image, and comparing the first vector form with the second vector form.
Abstract translation: 提供了一种使用向量化来检测图案的缺陷以提高OPC建模和OPC验证中的精度和效率的方法。 该方法包括获取与目标图案相关联的目标布局图像，获取与形成在基板上的图案相关联的图案图像，从图案图像中提取边缘图像，基于目标布局图像产生第一矢量形状， 基于边缘图像的第二矢量形式，并且将第一矢量形式与第二矢量形式进行比较。
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公开(公告)号：US09703189B2
公开(公告)日：2017-07-11
申请号：US14685620
申请日：2015-04-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Ki-Ho Yang , Sibo Cai , Seung-Hune Yang
Abstract: In a method of calculating a shift value of a cell contact, a reference region and a correction region may be set on an image of an actual cell block. The cell block may include a plurality of actual cell contacts formed using a mask. Each of preliminary shift values of the actual cell contacts with respect to target cell contacts in a target cell block to be formed using the mask may be measured based on the image. The preliminary shift values of the actual cell contacts in the reference region may be minimized. Actual shift values of the actual cell contacts in the correction region with respect to the minimized preliminary shift values may be calculated. Thus, the mask may be corrected using the accurately measured shift values so that the cell contacts may have designed positions.
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公开(公告)号：US10126646B2
公开(公告)日：2018-11-13
申请号：US15615851
申请日：2017-06-07
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Ki-Ho Yang , Sibo Cai , Seung-Hune Yang
Abstract: In a method of calculating a shift value of a cell contact, a reference region and a correction region may be set on an image of an actual cell block. The cell block may include a plurality of actual cell contacts formed using a mask. Each of preliminary shift values of the actual cell contacts with respect to target cell contacts in a target cell block to be formed using the mask may be measured based on the image. The preliminary shift values of the actual cell contacts in the reference region may be minimized. Actual shift values of the actual cell contacts in the correction region with respect to the minimized preliminary shift values may be calculated. Thus, the mask may be corrected using the accurately measured shift values so that the cell contacts may have designed positions.
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